The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 19, 2022
Filed:
Nov. 22, 2018
Dnf Co., Ltd., Daejeon, KR;
Sung Gi Kim, Daejeon, KR;
Joong Jin Park, Daejeon, KR;
Byeong-il Yang, Daejeon, KR;
Se Jin Jang, Jeju-Si, KR;
Gun-Joo Park, Daejeon, KR;
Jeong Joo Park, Daejeon, KR;
Hee Yeon Jeong, Jecheon-Si, KR;
Sam Dong Lee, Daejeon, KR;
Sang Ick Lee, Daejeon, KR;
Myong Woon Kim, Daejeon, KR;
DNF CO., LTD., Daejeon, KR;
Abstract
Provided are a composition for depositing a silicon-containing thin film, containing a trisilylamine compound and a method for producing a silicon-containing thin film using the same, and more particularly, a composition for depositing a silicon-containing thin film, containing a trisilylamine compound which is capable of forming a silicon-containing thin film at a very high deposition rate at a low temperature to be usable as a precursor of a silicon-containing thin film and an encapsulant of a display, and a method for producing a silicon-containing thin film by using the same.