Youn-Joung Cho

USPTO Granted Patents = 31 (Patent Applications = 1)

Average Co-Inventor Count = 6.3

ph-index = 3

Forward Citations = 32(Granted Patents)

Location History:

Gyeonggi-do, KR (2010)
Suwon-si, KR (2008 - 2016)
Jwasepmg-si, KR (2020)
Hwaseong-si, KR (2016 - 2024)

Company Filing History:

31 out of 131,214

Samsung Electronics Co., Ltd.

L'air Liquide Societe Anonyme Pour L'etude Et L'exploitation Des Procedes Georges Claude

patents

where one patent can have more than one assignee

Years Active: 2008-2024

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31 patents (USPTO):Sort by Forward Citations

Abstract keywords

1. 11929389 - Integrated circuit device (2024-03-12),

2. 11062940 - Organometallic precursors, methods of forming a layer using the same and methods of manufacturing semiconductor devices using the same (2021-07-13),

3. 11043553 - Integrated circuit device (2021-06-22),

4. 10923341 - Method of forming oxide layer and method of fabricating semiconductor device (2021-02-16),

5. 10913754 - Lanthanum compound and methods of forming thin film and integrated circuit device using the lanthanum compound (2021-02-09),

6. 10882873 - Method of forming tin-containing material film and method of synthesizing a tin compound (2021-01-05),

7. 10752645 - Method of forming a thin film (2020-08-25),

8. 10651031 - Tantalum compound (2020-05-12),

9. 10553449 - Methods of forming a silicon layer, methods of forming patterns, and methods of manufacturing semiconductor devices using the same (2020-02-04),

10. 10361118 - Organometallic precursors, methods of forming a layer using the same and methods of manufacturing semiconductor devices using the same (2019-07-23),

11. 10329312 - Lanthanum compound, method of synthesizing lanthanum compound, lanthanum precursor composition, method of forming thin film, and method of manufacturing integrated circuit device (2019-06-25),

12. 10319590 - Method of forming semiconductor device using metal-containing hardmask to pattern photoresist having protected polymer (2019-06-11),

13. 10259836 - Methods of forming thin film and fabricating integrated circuit device using niobium compound (2019-04-16),

14. 10242877 - Aluminum compound and methods of forming thin film and fabricating integrated circuit device by using the same (2019-03-26),

15. 10224200 - Aluminum compound, method of forming thin film by using the same, and method of fabricating integrated circuit device (2019-03-05),

Title: The Innovative Contributions of Youn-Joung Cho in Semiconductor Technology

Introduction: Youn-Joung Cho, based in Hwaseong-si, South Korea, is a prolific inventor with a remarkable portfolio of 31 patents in the field of semiconductor technology. His groundbreaking work has significantly impacted the industry, particularly through his advancements in integrated circuit devices and novel organometallic precursors.

Latest Patents: Among his latest innovations, Cho has developed an integrated circuit device that features a robust dielectric layer structure designed to enhance performance. This integrated circuit includes a lower electrode, an upper electrode, and a dielectric layer structure that improves electrical efficiency. The dielectric layer consists of a first dielectric layer with grains extending between the two electrodes and a second dielectric layer made of a material with a higher bandgap energy. This innovation promises to improve the functionality of semiconductor devices significantly.

Additionally, his work on organometallic precursors showcases his expertise in material science. One notable patent describes an organometallic precursor that uses tungsten as a central metal, bonded with a cyclopentadienyl ligand and additional structures that enhance reactivity. These developments are crucial for the advancement of semiconductor manufacturing processes.

Career Highlights: Throughout his career, Youn-Joung Cho has been associated with leading companies, including Samsung Electronics Co., Ltd. and Adeka Corporation. His contributions in these organizations have fostered technological advancements and opened up new avenues for innovation in the semiconductor sector.

Collaborations: Cho has collaborated with esteemed professionals in the industry, including Jae-Soon Lim and Gyu-Hee Park. These partnerships have enhanced the research and development efforts within his projects, leading to significant breakthroughs and enhancements in semiconductor technology.

Conclusion: Youn-Joung Cho's dedication to innovation and his extensive patent portfolio reflect his significant contributions to the field of semiconductor technology. His work continues to influence advancements in integrated circuits and materials used in semiconductor manufacturing, marking him as a key figure in modern technological development.

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