The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 04, 2025
Filed:
Dec. 27, 2022
Applicant:
Dnf Co., Ltd., Daejeon, KR;
Inventors:
Yonghee Kwone, Daejeon, KR;
Youngjae Im, Daejeon, KR;
Sangyong Jeon, Daejeon, KR;
Taeseok Byun, Daejeon, KR;
Sangchan Lee, Daejeon, KR;
Sangick Lee, Daejeon, KR;
Assignee:
DNF CO., LTD., Daejeon, KR;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C07F 5/00 (2006.01); C23C 16/40 (2006.01); C23C 16/455 (2006.01);
U.S. Cl.
CPC ...
C07F 5/00 (2013.01); C23C 16/407 (2013.01); C23C 16/45553 (2013.01);
Abstract
Provided are an indium compound, a method of producing the same, a composition for depositing an indium-containing thin film including the same, and a method of producing an indium-containing thin film using the same. The provided indium compound has excellent thermal stability, high volatility, and improved vapor pressure, thereby producing an indium-containing thin film having a uniform thickness with an improved deposition speed by adopting the indium compound.