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Fremont, CA, United States of America

American Air Liquide, Inc.

Calculating rank

USPTO Granted Patents = 340

% Expired Patents = 29.7

CIPO Patents = 1

Forward Citations = 3,836

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337 inventors (with patents filed for the assignee):

Christian Dussarrat (41 out of 84 patents)

Venkateswara R Pallem (37 out of 38 patents)

Nathan Stafford (26 out of 32 patents)

4. Ovidiu Marin (20 out of 39 patents)

5. Hwa-Chi Wang (19 out of 23 patents)

6. Vincent M Omarjee (17 out of 18 patents)

7. Tracey Jacksier (17 out of 24 patents)

8. Jean-Marc Girard (15 out of 79 patents)

9. Rahul Gupta (15 out of 16 patents)

10. Richard J Udischas (14 out of 16 patents)

11. Glenn Kuchenbeiser (13 out of 16 patents)

12. Yao-En Li (13 out of 20 patents)

13. James J McAndrew (13 out of 16 patents)

14. Vasuhi Rasanayagam (12 out of 12 patents)

15. Taekyu Kang (11 out of 22 patents)

Core Competencies:

Semiconductor Structures

ALD/CVD Precursors

Selective Etching

Halocarbon Compounds

Silicon Nitride

Oxide Films

Nitrogen-Containing Compounds

Heat Recovery

Gallium Precursors

Liquid Polysilanes

Plasma Etching

Ozone Treatment

340 patents: Sort by Forward Citations

1. 12703652 - Furnace operation method (2026-08-11),

2. 12686921 - Fluorination of ancillary ligands of group (III) precursors and their applications in vapor depositions (2026-07-21),

3. 12642026 - Nitrogen-containing aromatic or ring structure molecules for plasma etch and deposition (2026-05-26),

4. 12624248 - Curable formulations for forming low-k dielectric silicon-containing films using polycarbosilazane (2026-05-12),

5. 12467134 - Method for deposition of gallium-containing film with gallium precursors (2025-11-11),

6. 12435096 - Indium precursors for vapor depositions (2025-10-07),

7. 12366415 - Heat exchanger and use thereof (2025-07-22),

8. 12341017 - Etching methods with alternating non-plasma and plasma etching processes (2025-06-24),

9. 12327732 - Method to improve profile control during selective etching of silicon nitride spacers (2025-06-10),

10. 12312264 - Method for mixing gas-free liquid oxidant with process liquid (2025-05-27),

11. 12224177 - Method of running an etch process in higher selectivity to mask and polymer regime by using a cyclic etch process (2025-02-11),

12. 12188123 - Deposition of iodine-containing carbon films (2025-01-07),

13. 12187853 - Silicon-based self-assembling monolayer compositions and surface preparation using the same (2025-01-07),

14. 12106971 - High conductive passivation layers and method of forming the same during high aspect ratio plasma etching (2024-10-01),

15. 12083493 - Selective adsorption of halocarbon impurities containing cl, br and i in fluorocarbons or hydrofluorocarbons using adsorbent supported metal oxide (2024-09-10),

Company Overview

American Air Liquide, Inc., based in Fremont, CA, specializes in advanced technologies for semiconductor etching. The company focuses on developing and manufacturing innovative solutions in semiconductor structures, including ALD/CVD precursors and selective etching processes. Their expertise extends to halocarbon compounds, silicon nitride, and oxide films, as well as nitrogen-containing compounds. Additionally, they are involved in heat recovery technologies, contributing to the efficiency and sustainability of semiconductor manufacturing.

Profile summary synthesized from public USPTO records and patent filings.

Company Badge

USPTO Data Jan 1 1976 - Oct 27 2026

340 Patents

#5 in Fremont, CA

#281 in California

#1,320 in US

#2,661 in the World

Fremont, CA, United States of America

American Air Liquide, Inc.

Forward Citations = 3,836

337 inventors:

Christian Dussarrat (41 out of 84 patents)

Venkateswara R Pallem (37 out of 38 patents)

Nathan Stafford (26 out of 32 patents)

4. Ovidiu Marin (20 out of 39 patents)

5. Hwa-Chi Wang (19 out of 23 patents)

IDiyas Innovation Intelligence. (2026). Company Patent Portfolio: American Air Liquide, Inc.. Retrieved from https://idiyas.com/company/american-air-liquide

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]

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