IDiyas

For the Inventor, By the Inventor

Grenoble, France

Vincent M Omarjee

USPTO Granted Patents = 18 


Average Co-Inventor Count = 4.6

ph-index = 3

Forward Citations = 84(Granted Patents)


Location History:

  • Albany, NY (US) (2013)
  • Bear, DE (US) (2011 - 2014)
  • Menlo Park, CA (US) (2016)
  • Grenoble, FR (2014 - 2021)
  • Paris, FR (2022)
  • Versailles, FR (2018 - 2023)

Company Filing History:

goldMedal17 out of 336 
 
American Air Liquide, Inc.
 patents
silverMedal6 out of 37 
 
Air Liquide Electronics U.S. LP
 patents
bronzeMedal6 out of 447 
 
L'air Liquide Société Anonyme Pour L'etude Et L'exploitation Des Procédés Georges Claude
 patents
4. 4 out of 985 
 
L'air Liquide Societe Anonyme Pour L'etude Et L'exploitation Des Procedes Georges Claude
 patents
5. 1 out of 10,295 
 
Tokyo Electron Limited
 patents
6. 1 out of 24 
 
Airgas, Inc.
 patents
where one patent can have more than one assignee

Years Active: 2011-2023

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18 patents (USPTO):
1. 11679156 - Use of stable isotopes to prove authentication of manufacturing location (2023-06-20),
2. 11430663 - Iodine-containing compounds for etching semiconductor structures (2022-08-30),
3. 11152223 - Fluorocarbon molecules for high aspect ratio oxide etch (2021-10-19),
4. 10720335 - Chemistries for TSV/MEMS/power device etching (2020-07-21),
5. 10607850 - Iodine-containing compounds for etching semiconductor structures (2020-03-31),
6. 10381240 - Fluorocarbon molecules for high aspect ratio oxide etch (2019-08-13),
7. 10103031 - Chemistries for TSV/MEMS/power device etching (2018-10-16),
8. 9892932 - Chemistries for TSV/MEMS/power device etching (2018-02-13),
9. 9514959 - Fluorocarbon molecules for high aspect ratio oxide etch (2016-12-06),
10. 9121093 - Bis-ketoiminate copper precursors for deposition of copper-containing films and methods thereof (2015-09-01),
11. 9064694 - Nitridation of atomic layer deposited high-k dielectrics using trisilylamine (2015-06-23),
12. 9045509 - Hafnium- and zirconium-containing precursors and methods of using the same (2015-06-02),
13. 8852460 - Alkali earth metal precursors for depositing calcium and strontium containing films (2014-10-07),
14. 8765220 - Methods of making and deposition methods using hafnium- or zirconium-containing compounds (2014-07-01),
15. 8367531 - Aluminum implant using new compounds (2013-02-05),

Title: The Innovative Mind of Vincent M Omarjee

Introduction: Vincent M Omarjee is a pioneering inventor hailing from Grenoble, France. His creative spirit and dedication to innovation have led to remarkable contributions in the field of technology.

Latest Patents: Vincent M Omarjee's latest patents showcase his forward-thinking approach to problem-solving and technology advancement. His recent inventions have been recognized for their ingenuity and practical applications in various industries.

Career Highlights: Throughout his illustrious career, Vincent M Omarjee has consistently pushed the boundaries of innovation. His work has garnered attention for its impact on improving efficiency, sustainability, and overall progress in the technological landscape.

Collaborations: Vincent M Omarjee has collaborated with leading experts in the field to bring his inventions to life. His partnerships with top research institutions, universities, and companies have been instrumental in realizing groundbreaking ideas and turning them into tangible innovations.

Conclusion: Vincent M Omarjee's passion for innovation and his relentless pursuit of excellence make him a standout figure in the world of inventors. His contributions have not only shaped the technological landscape but have also inspired future generations to think outside the box and strive for greatness in the realm of invention.

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