The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 16, 2018
Filed:
Sep. 08, 2017
American Air Liquide, Inc., Fremont, CA (US);
L'air Liquide, Société Anonyme Pour L'etude ET L'exploitation Des Procédés Georges Claude, Paris, FR;
Air Liquide Electronics U.s. Lp, Dallas, TX (US);
Peng Shen, Tsukuba, JP;
Christian Dussarrat, Tokyo, JP;
Curtis Anderson, Downingtown, PA (US);
Rahul Gupta, St. Louis, MO (US);
Vincent M. Omarjee, Versailles, FR;
Nathan Stafford, Damascus, OR (US);
L'Air Liquide Société Anonyme pour l'Etude et l'Exploitation des Georges Claude, Paris, FR;
American Air Liquide, Inc., Fremont, CA (US);
Air Liquide Electronics U.S. LP, Dallas, TX (US);
Abstract
Replacement chemistries for the cCFpassivation gas in the Bosch etch process and processes for using the same are disclosed. These chemistries have the formula CHF, with 1≤x<7, 1≤y≤13, and 1≤z≤13. The replacement chemistries may reduce RIE lag associated with deep silicon aperture etching.