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For the Inventor, By the Inventor

Wilmington, DE, United States of America

Christian Dussarrat

This inventor holds 84 USPTO granted patents and 18 published patent applications and 7 EPO patents, primarily in Vapor Deposition Chemistry (CPC class C23C16-45553). Top assignees: L'air Liquide,societe Anonyme Pour L'etude Et L'exploitation Des Procedes Georges Claude, American Air Liquide, Inc., Air Liquide Electronics U.S. LP. Active years: 2005-2023.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Christian Dussarrat. Retrieved from https://idiyas.com/inventor/christian-dussarrat

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 84 

% Patents Active = 77.4

 

Average Co-Inventor Count = 2.5

ph-index = 13

Forward Citations = 1,511(Granted Patents)

Forward Citations (Not Self Cited) = 1,458(Dec 10, 2025)


Inventors with similar research interests:

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Location History:

  • Ibaraki, JP (2005 - 2008)
  • Tsukuba, JP (2009)
  • Wilminton, DE (US) (2012)
  • Newark, DE (US) (2014)
  • Houston, TX (US) (2014)
  • Toyko, JP (2014)
  • Wilmington, DE (US) (2010 - 2015)
  • Tokyo, JP (2013 - 2023)

Company Filing History:

goldMedal48 out of 1,527 
 
L'air Liquide,societe Anonyme Pour L'etude Et L'exploitation Des Procedes Georges Claude
 patents
silverMedal41 out of 340 
 
American Air Liquide, Inc.
 patents
bronzeMedal5 out of 37 
 
Air Liquide Electronics U.S. LP
 patents
4. 5 out of 295 
 
L'air Liquide, Societe Anonyme a Directoire Et Conseil De Surveillance Pour L'etude Et L'exploitation Des Procedes Georges Claude
 patents
5. 1 out of 14,454 
 
Applied Materials, Inc.
 patents
6. 1 out of 10,904 
 
Tokyo Electron Limited
 patents
where one patent can have more than one assignee

Years Active: 2005-2023

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Areas of Expertise:
Vapor Deposition
Hafnium Films
Fluorocarbon Etching
Semiconductor Manufacturing
ALD Precursors
Dielectric Films
TSV Chemistries
Copper Precursors
Zirconium Films
Lanthanide Precursors
Silicon Films
Metal Precursors
84 patents (USPTO):Explore Patents
1. 11549182 - Group 6 transition metal-containing compounds for vapor deposition of group 6 transition metal-containing films (2023-01-10),
2. 11162175 - Group 6 transition metal-containing compounds for vapor deposition of group 6 transition metal-containing films (2021-11-02),
3. 11152223 - Fluorocarbon molecules for high aspect ratio oxide etch (2021-10-19),
4. 10731251 - Group 6 transition metal-containing compounds for vapor deposition of group 6 transition metal-containing films (2020-08-04),
5. 10720335 - Chemistries for TSV/MEMS/power device etching (2020-07-21),
6. 10381240 - Fluorocarbon molecules for high aspect ratio oxide etch (2019-08-13),
7. 10217629 - Method of forming dielectric films, new precursors and their use in semiconductor manufacturing (2019-02-26),
8. 10106568 - Hafnium-containing film forming compositions for vapor deposition of hafnium-containing films (2018-10-23),
9. 10103031 - Chemistries for TSV/MEMS/power device etching (2018-10-16),
10. 10094021 - Group 6 transition metal-containing compounds for vapor deposition of group 6 transition metal-containing films (2018-10-09),
11. 9938303 - Organosilane precursors for ALD/CVD silicon-containing film applications (2018-04-10),
12. 9911590 - Methods of forming dielectric films, new precursors and their use in semiconductor manufacturing (2018-03-06),
13. 9892932 - Chemistries for TSV/MEMS/power device etching (2018-02-13),
14. 9868753 - Germanium- and zirconium-containing composition for vapor deposition of zirconium-containing films (2018-01-16),
15. 9822132 - Hexacoordinate silicon-containing precursors for ALD/CVD silicon-containing film applications (2017-11-21),

Title: Christian Dussarrat: Innovator in Vapor Deposition Technologies

Introduction

Christian Dussarrat is an accomplished inventor based in Wilmington, DE, boasting an impressive portfolio of 84 patents. His work primarily focuses on materials science, particularly in the area of vapor deposition technologies, which are crucial in various industrial applications.

Latest Patents

Among his latest innovations, Dussarrat has developed Group 6 transition metal-containing compounds for vapor deposition of Group 6 transition metal-containing films. These compositions comprise Group 6 transition metal-containing precursors, including Mo or W, utilizing various chemical formulas for the successful synthesis and deposition of films on substrates. His methods enhance the efficiency and effectiveness of vapor deposition processes, making significant contributions to the field.

Career Highlights

Dussarrat has held key positions at notable companies, including American Air Liquide, Inc. and L'air Liquide, Société Anonyme Pour L'étude Et L'exploitation Des Procédés Georges Claude. His extensive experience in these organizations has greatly contributed to his expertise in material development and application.

Collaborations

Throughout his career, Dussarrat has collaborated with distinguished colleagues such as Vincent M. Omarjee and Venkateswara R. Pallem. These partnerships have fostered innovation and advancements in vapor deposition technologies, enabling the successful exploration and implementation of cutting-edge solutions.

Conclusion

Christian Dussarrat stands out as a visionary inventor in the realm of vapor deposition technologies. With a remarkable number of patents to his name and a history of collaboration with leading professionals, his contributions are shaping the future of material science and its applications in various industries. His work continues to inspire new developments and innovations in the field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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