The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 02, 2021

Filed:

Mar. 04, 2020
Applicant:

L'air Liquide, Société Anonyme Pour L'etude ET L'exploitation Des Procédés Georges Claude, Paris, FR;

Inventors:

Clément Lansalot-Matras, Plélo, FR;

Julien Lieffrig, Soucy, FR;

Christian Dussarrat, Tokyo, JP;

Antoine Colas, Ozoir la Ferriere, FR;

Jong Min Kim, Adachi, JP;

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/455 (2006.01); C23C 16/40 (2006.01); C23C 16/30 (2006.01);
U.S. Cl.
CPC ...
C23C 16/45553 (2013.01); C23C 16/30 (2013.01); C23C 16/405 (2013.01);
Abstract

Disclosed are Group 6 film forming compositions comprising Group 6 transition metal-containing precursors selected from the group consisting of:M(=O)(OR)  Formula I,M(=O)(NR)  Formula II,M(=O)(NR)  Formula III,M(=NR)(OR)  Formula IV, andM(=O)(OR)  Formula V,wherein M is Mo or W and each R is independently H, a C1 to C6 alkyl group, or SiR', wherein R′ is H or a C1 to C6 alkyl group. Also disclosed are methods of synthesizing and using the disclosed compositions to deposit Group 6 transition metal-containing films on substrates via vapor deposition processes.


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