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For the Inventor, By the Inventor

Princeton, NJ, United States of America

Clément Lansalot-Matras

This inventor holds 26 USPTO granted patents and 6 published patent applications and 1 EPO patent, primarily in Thin Film Deposition. Top assignees: L'air Liquide,societe Anonyme Pour L'etude Et L'exploitation Des Procedes Georges Claude, American Air Liquide, Inc.. Active years: 2012-2023.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Clément Lansalot-Matras. Retrieved from https://idiyas.com/inventor/clément-lansalot-matras

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 26 

% Patents Active = 65.4


Average Co-Inventor Count = 2.7

ph-index = 3

Forward Citations = 503(Granted Patents)


Location History:

  • Tsukuba, JP (2012 - 2014)
  • Seoul, KR (2015 - 2016)
  • Morrisville, PA (US) (2018)
  • Princeton, NJ (US) (2017 - 2021)
  • Plélo, FR (2021)
  • Pléto, FR (2023)

Company Filing History:

goldMedal21 out of 1,528 
 
L'air Liquide,societe Anonyme Pour L'etude Et L'exploitation Des Procedes Georges Claude
 patents
silverMedal7 out of 340 
 
American Air Liquide, Inc.
 patents
where one patent can have more than one assignee

Years Active: 2012-2023

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Areas of Expertise:
Transition Metal Compounds
Vapor Deposition
Etching Processes
Film Forming Compositions
Niobium Films
Hafnium Films
Tantalum Films
Zirconium Films
Copper Precursors
Ruthenium Precursors
Lanthanum Films
Cyclopentadienyl Precursors
26 patents (USPTO):Explore Patents
1. 11549182 - Group 6 transition metal-containing compounds for vapor deposition of group 6 transition metal-containing films (2023-01-10),
2. 11162175 - Group 6 transition metal-containing compounds for vapor deposition of group 6 transition metal-containing films (2021-11-02),
3. 11021793 - Group 6 transition metal-containing compositions for vapor deposition of group 6 transition metal-containing films (2021-06-01),
4. 10731251 - Group 6 transition metal-containing compounds for vapor deposition of group 6 transition metal-containing films (2020-08-04),
5. 10648087 - Etching reactants and plasma-free etching processes using the same (2020-05-12),
6. 10174423 - Niobium-containing film forming compositions and vapor deposition of Niobium-containing films (2019-01-08),
7. 10106887 - Group 5 transition metal-containing compounds for vapor deposition of group 5 transition metal-containing films (2018-10-23),
8. 10106568 - Hafnium-containing film forming compositions for vapor deposition of hafnium-containing films (2018-10-23),
9. 10094021 - Group 6 transition metal-containing compounds for vapor deposition of group 6 transition metal-containing films (2018-10-09),
10. 10023462 - Niobium-Nitride film forming compositions and vapor deposition of Niobium-Nitride films (2018-07-17),
11. 9868753 - Germanium- and zirconium-containing composition for vapor deposition of zirconium-containing films (2018-01-16),
12. 9790591 - Titanium-containing film forming compositions for vapor deposition of titanium-containing films (2017-10-17),
13. 9786671 - Niobium-containing film forming compositions and vapor deposition of niobium-containing films (2017-10-10),
14. 9748249 - Tantalum-containing film forming compositions and vapor deposition of tantalum-containing films (2017-08-29),
15. 9691771 - Vanadium-containing film forming compositions and vapor deposition of vanadium-containing films (2017-06-27),

Title: Clément Lansalot-Matras: A Visionary Inventor Paving the Way for Sustainable Technological Advancement

Introduction:

Clément Lansalot-Matras, a prolific inventor based in Princeton, NJ, is revered for his innovative thinking, unwavering commitment to sustainability, and continuous drive towards technological progress. With an impressive portfolio of 26 patents, his groundbreaking work has significantly impacted the field of materials science and vapor deposition processes.

Latest Patents:

Among his latest patents is the development of Group 6 transition metal-containing compounds for vapor deposition of group 6 transition metal-containing films. These compositions include precursors such as M(=O)(OR) and M(=O)(NR), where M represents Mo or W, and R varies from H to alkyl groups. The patented methods focus on synthesizing and utilizing these compounds to deposit high-quality Group 6 transition metal-containing films on substrates through vapor deposition techniques.

Career Highlights:

Throughout his illustrious career, Clément Lansalot-Matras has held key positions at renowned companies such as L'Air Liquide, Société Anonyme Pour l'Etude et l'Exploitation des Procédés Georges Claude, and American Air Liquide, Inc. His expertise in developing cutting-edge technologies for industrial applications has earned him recognition as a trailblazer in the field of materials engineering.

Collaborations:

Collaborating with esteemed colleagues like Wontae Noh and Julien Lieffrig, Clément has spearheaded research projects aimed at pushing the boundaries of innovation in vapor deposition methods. His collaborative efforts have led to the creation of sustainable solutions that not only enhance product performance but also reduce environmental impact.

Conclusion:

In conclusion, Clément Lansalot-Matras stands as a beacon of inspiration for aspiring inventors, showcasing the transformative power of creative thinking and dedication to sustainability in driving technological advancement. His contributions to the realm of materials science continue to shape the future of innovation, setting a high standard for excellence in invention and patent application.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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