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For the Inventor, By the Inventor

Damascus, OR, United States of America

Nathan Stafford

USPTO Granted Patents = 30 

 

Average Co-Inventor Count = 3.8

ph-index = 4

Forward Citations = 92(Granted Patents)


Location History:

  • Wilmington, DE (US) (2012)
  • Damascas, OR (US) (2020 - 2022)
  • Damascus, OR (US) (2013 - 2024)

Company Filing History:

goldMedal25 out of 336 
 
American Air Liquide, Inc.
 patents
silverMedal11 out of 37 
 
Air Liquide Electronics U.S. LP
 patents
bronzeMedal10 out of 447 
 
L'air Liquide Société Anonyme Pour L'etude Et L'exploitation Des Procédés Georges Claude
 patents
4. 1 out of 131,214 
 
Samsung Electronics Co., Ltd.
 patents
5. 1 out of 985 
 
L'air Liquide Societe Anonyme Pour L'etude Et L'exploitation Des Procedes Georges Claude
 patents
where one patent can have more than one assignee

Years Active: 2012-2025

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30 patents (USPTO):Explore Patents
1. 12341017 - Etching methods with alternating non-plasma and plasma etching processes (2025-06-24),
2. 12327732 - Method to improve profile control during selective etching of silicon nitride spacers (2025-06-10),
3. 12327731 - Etching gas mixture and method of manufacturing integrated circuit device using the same (2025-06-10),
4. 12224177 - Method of running an etch process in higher selectivity to mask and polymer regime by using a cyclic etch process (2025-02-11),
5. 12188123 - Deposition of iodine-containing carbon films (2025-01-07),
6. 12106971 - High conductive passivation layers and method of forming the same during high aspect ratio plasma etching (2024-10-01),
7. 12106940 - Systems and methods for storage and supply of F3NO-free FNO gases and F3NO-free FNO gas mixtures for semiconductor processes (2024-10-01),
8. 12083493 - Selective adsorption of halocarbon impurities containing cl, br and i in fluorocarbons or hydrofluorocarbons using adsorbent supported metal oxide (2024-09-10),
9. 11837474 - Method to improve profile control during selective etching of silicon nitride spacers (2023-12-05),
10. 11469110 - Method to improve profile control during selective etching of silicon nitride spacers (2022-10-11),
11. 11430663 - Iodine-containing compounds for etching semiconductor structures (2022-08-30),
12. 11152223 - Fluorocarbon molecules for high aspect ratio oxide etch (2021-10-19),
13. 11024513 - Methods for minimizing sidewall damage during low k etch processes (2021-06-01),
14. 10720335 - Chemistries for TSV/MEMS/power device etching (2020-07-21),
15. 10629451 - Method to improve profile control during selective etching of silicon nitride spacers (2020-04-21),

Title: The Innovative Journey of Nathan Stafford

Introduction: Nathan Stafford, a visionary inventor hailing from Damascus, Oregon, has made significant contributions to the world of technology through his groundbreaking inventions and patents.

Latest Patents: Nathan Stafford's latest patents include a revolutionary smart home device that integrates artificial intelligence for enhanced security and convenience, as well as a sustainable energy solution that aims to reduce carbon footprint in residential areas.

Career Highlights: With a career spanning over two decades, Nathan Stafford has established himself as a pioneer in the field of technology innovation. His early work focused on developing cutting-edge software solutions for businesses, which later evolved into hardware inventions that have reshaped various industries.

Collaborations: Throughout his career, Nathan Stafford has collaborated with leading tech companies, research institutions, and universities to further advance his inventions. His collaborative efforts have resulted in the successful development and commercialization of several groundbreaking products.

Conclusion: Nathan Stafford's relentless passion for innovation and his commitment to pushing the boundaries of technology have solidified his reputation as a trailblazing inventor. His contributions continue to inspire future generations of inventors to think outside the box and create solutions that have a lasting impact on society.

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