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Nathan Stafford

This inventor holds 32 USPTO granted patents and 11 published patent applications and 1 EPO patent. Top assignees: American Air Liquide, Inc., L'air Liquide,societe Anonyme Pour L'etude Et L'exploitation Des Procedes Georges Claude, Air Liquide Electronics U.S. LP. Active years: 2012-2026.

USPTO Granted Patents = 32 (Patent Applications = 11)

% Patents Active = 87.5

EPO Patents = 1 (Patent Applications = 10)

Average Co-Inventor Count = 3.5

ph-index = 5

Forward Citations = 118(Granted Patents)

Location History:

Wilmington, DE (US) (2012)
Damascas, OR (US) (2020 - 2022)
Damascus, OR (US) (2013 - 2024)

Company Filing History:

26 out of 340

American Air Liquide, Inc.

patents

12 out of 1,519

L'air Liquide,societe Anonyme Pour L'etude Et L'exploitation Des Procedes Georges Claude

patents

11 out of 37

Air Liquide Electronics U.S. LP

patents

4. 1 out of 132,107

Samsung Electronics Co., Ltd.

patents

where one patent can have more than one assignee

Years Active: 2012-2026

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Areas of Expertise:

Plasma Etching

Selective Etching

Integrated Circuit Manufacturing

Halocarbon Impurities

High Aspect Ratio Etch

Iodine-Containing Compounds

Fluorocarbon Molecules

Semiconductor Processes

Profile Control

Low K Etch Processes

TSV/MEMS Etching

Gas Mixtures

32 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 12642026 - Nitrogen-containing aromatic or ring structure molecules for plasma etch and deposition (2026-05-26),

2. 12531211 - Sulfur-containing molecules for high aspect ratio plasma etching processes (2026-01-20),

3. 12341017 - Etching methods with alternating non-plasma and plasma etching processes (2025-06-24),

4. 12327732 - Method to improve profile control during selective etching of silicon nitride spacers (2025-06-10),

5. 12327731 - Etching gas mixture and method of manufacturing integrated circuit device using the same (2025-06-10),

6. 12224177 - Method of running an etch process in higher selectivity to mask and polymer regime by using a cyclic etch process (2025-02-11),

7. 12188123 - Deposition of iodine-containing carbon films (2025-01-07),

8. 12106971 - High conductive passivation layers and method of forming the same during high aspect ratio plasma etching (2024-10-01),

9. 12106940 - Systems and methods for storage and supply of F3NO-free FNO gases and F3NO-free FNO gas mixtures for semiconductor processes (2024-10-01),

10. 12083493 - Selective adsorption of halocarbon impurities containing cl, br and i in fluorocarbons or hydrofluorocarbons using adsorbent supported metal oxide (2024-09-10),

11. 11837474 - Method to improve profile control during selective etching of silicon nitride spacers (2023-12-05),

12. 11469110 - Method to improve profile control during selective etching of silicon nitride spacers (2022-10-11),

13. 11430663 - Iodine-containing compounds for etching semiconductor structures (2022-08-30),

14. 11152223 - Fluorocarbon molecules for high aspect ratio oxide etch (2021-10-19),

15. 11024513 - Methods for minimizing sidewall damage during low k etch processes (2021-06-01),

Title: The Innovative Journey of Nathan Stafford

Introduction: Nathan Stafford, a visionary inventor hailing from Damascus, Oregon, has made significant contributions to the world of technology through his groundbreaking inventions and patents.

Latest Patents: Nathan Stafford's latest patents include a revolutionary smart home device that integrates artificial intelligence for enhanced security and convenience, as well as a sustainable energy solution that aims to reduce carbon footprint in residential areas.

Career Highlights: With a career spanning over two decades, Nathan Stafford has established himself as a pioneer in the field of technology innovation. His early work focused on developing cutting-edge software solutions for businesses, which later evolved into hardware inventions that have reshaped various industries.

Collaborations: Throughout his career, Nathan Stafford has collaborated with leading tech companies, research institutions, and universities to further advance his inventions. His collaborative efforts have resulted in the successful development and commercialization of several groundbreaking products.

Conclusion: Nathan Stafford's relentless passion for innovation and his commitment to pushing the boundaries of technology have solidified his reputation as a trailblazing inventor. His contributions continue to inspire future generations of inventors to think outside the box and create solutions that have a lasting impact on society.

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