The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 11, 2025
Filed:
Feb. 08, 2022
Applicant:
American Air Liquide, Inc., Fremont, CA (US);
Inventors:
Xiangyu Guo, Bear, DE;
Nathan Stafford, Damascus, OR (US);
Assignee:
American Air Liquide, Inc., Fremont, CA (US);
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/311 (2006.01);
U.S. Cl.
CPC ...
H01L 21/31116 (2013.01); H01L 21/31138 (2013.01); H01L 21/31144 (2013.01);
Abstract
This disclosure describes an improved etch selectivity of a-C mask during HAR etch processes by using a cyclic etch process. The process has two principle steps: These steps are repeated between a partial etch process (polymer creating) and polymer cleaning step (cycle etching).
Guo, Xiangyu. (2025). Method of running an etch process in higher selectivity to mask and polymer regime by using a cyclic etch process (U.S. Patent No. 12224177). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12224177
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile