The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 07, 2025
Filed:
Dec. 17, 2021
American Air Liquide, Inc., Fremont, CA (US);
Phong Nguyen, Newark, DE (US);
Fabrizio Marchegiani, Newark, DE (US);
Nathan Stafford, Damascus, OR (US);
Xiangyu Guo, Bear, DE (US);
American Air Liquide, Inc., Fremont, CA (US);
Abstract
A method for depositing an iodine-containing film on a substrate material comprises: exposing the substrate material to a vapor of a film-forming composition comprising an iodine-containing precursor having a formula of CHIF, wherein a=1-10, x≥0, y≥1, z≥0, x+y+z=a, 2or 2+2; provided that when a=1, x=2 and z=0, y is not equal to 2, and depositing the iodine-containing film formed by the iodine-containing precursor on the substrate material through a vapor deposition method. The method further comprises exposing the substrate material to a vapor of a co-reactant nitrogen-containing molecule having a general formula CHFNH, where x=1-6, y=0-13, z=0-13, and a=1-2 or CHFN—R, where x=1-6, y=0-13, z=0-13, and Ris a C-Chydrocarbon.