Newark, DE, United States of America

Fabrizio Marchegiani

This inventor holds 9 USPTO granted patents and 2 published patent applications and 1 EPO patent. Top assignees: American Air Liquide, Inc., L'air Liquide,societe Anonyme Pour L'etude Et L'exploitation Des Procedes Georges Claude, Air Liquide Electronics U.S. LP. Active years: 2019-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Fabrizio Marchegiani. Retrieved from https://idiyas.com/inventor/fabrizio-marchegiani

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 9 

% Patents Active = 100.0

 

Average Co-Inventor Count = 2.8

ph-index = 2

Forward Citations = 10(Granted Patents)


Location History:

  • Bear, DE (US) (2019)
  • Newark, DE (US) (2020)
  • Yokosuka, JP (2022)
  • Wilmington, DE (US) (2022 - 2023)

Company Filing History:


Years Active: 2019-2026

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9 patents (USPTO):Explore Patents

Certainly! Here is the article about inventor Fabrizio Marchegiani:

Title: Unveiling the Innovations of Fabrizio Marchegiani in Semiconductor Technology

Introduction:

Fabrizio Marchegiani, a distinguished inventor hailing from Newark, Delaware, has made significant contributions to the field of semiconductor technology. With an impressive portfolio of 5 patents, Marchegiani has showcased his expertise in developing cutting-edge solutions for etching processes and low-k dielectric silicon-containing films.

Latest Patents:

Marchegiani's latest patents demonstrate his innovative approach towards semiconductor manufacturing processes. One of his notable inventions includes the development of iodine-containing fluorocarbon and hydrofluorocarbon compounds for etching semiconductor structures. By utilizing activated iodine-containing etching compounds, he has revolutionized the etching process, reinforcing patterned mask layers and enhancing etch resistance.

Another groundbreaking patent by Marchegiani involves cureable formulations for forming low-k dielectric silicon-containing films using polycarbosilazane. This invention introduces silicon and carbon-containing film forming compositions that pave the way for advanced dielectric materials, essential for next-generation semiconductor devices.

Career Highlights:

Throughout his career, Marchegiani has garnered experience in esteemed companies such as American Air Liquide, Inc., and L'air Liquide, Société Anonyme Pour L'etude Et L'exploitation Des Procédés Georges Claude. His tenure in these organizations has honed his skills in semiconductor technologies and propelled him towards groundbreaking innovations in the field.

Collaborations:

Marchegiani has had the privilege of collaborating with talented individuals in his field, including Hui Sun and James Royer. Together, they have synergized their expertise to drive forward technological advancements in semiconductor manufacturing processes, establishing a legacy of innovation and excellence.

Conclusion:

In conclusion, Fabrizio Marchegiani stands as a visionary inventor in the realm of semiconductor technology, with a remarkable track record of patents that have redefined industry standards. His relentless pursuit of innovation and collaboration with industry peers continue to shape the future of semiconductor devices, cementing his legacy as a trailblazer in the field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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