The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 12, 2026
Filed:
Oct. 31, 2022
L'air Liquide, Société Anonyme Pour L'etude ET L'exploitation Des Procédés Georges Claude, Paris, FR;
American Air Liquide, Inc., Fremont, CA (US);
Yumin Liu, San Jose, CA (US);
Jean-Marc Girard, Versailles, FR;
Peng Zhang, Montvale, NJ (US);
Fan Qin, Bear, DE (US);
Gennadiy Itov, Flemington, NJ (US);
Fabrizio Marchegiani, Wilmington, DE (US);
Thomas J. Larrabee, Middletown, DE (US);
Venkateswara R. Pallem, Hockessin, DE (US);
L'Air Liquide, Societé Anonyme pour l'Etude et l'Exploitation des Procédés Georges Claude, Paris, FR;
American Air Liquide Inc., Fremont, CA (US);
Abstract
A method of forming a gap filling on a substrate, the substrate having gaps formed therein, comprises: producing a gap filling polycarbosilazane polymer or oligomer by a polymerization of a reaction mixture of carbosilanes with amines; forming a solution containing the gap filling polycarbosilazane polymer or oligomer; and contacting the solution with the substrate via a spin-on coating, spray coating, dip coating, or slit coating technique to fill the gaps in the substrate forming the silicon and carbon containing gap filling, wherein a concentration of the gap filling polycarbosilazane polymer or oligomer in the solution ranges from 1 to 60 wt %.