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For the Inventor, By the Inventor

Hockessin, DE, United States of America

Venkateswara R Pallem

USPTO Granted Patents = 37 

 

Average Co-Inventor Count = 3.1

ph-index = 5

Forward Citations = 91(Granted Patents)


Location History:

  • Bear, DE (US) (2012 - 2014)
  • Hockessin, DE (2015 - 2017)
  • Hockessin, DE (US) (2013 - 2023)

Company Filing History:

goldMedal36 out of 336 
 
American Air Liquide, Inc.
 patents
silverMedal8 out of 447 
 
L'air Liquide Société Anonyme Pour L'etude Et L'exploitation Des Procédés Georges Claude
 patents
bronzeMedal2 out of 37 
 
Air Liquide Electronics U.S. LP
 patents
4. 1 out of 985 
 
L'air Liquide Societe Anonyme Pour L'etude Et L'exploitation Des Procedes Georges Claude
 patents
where one patent can have more than one assignee

Years Active: 2012-2025

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37 patents (USPTO):Explore Patents
1. 12435096 - Indium precursors for vapor depositions (2025-10-07),
2. 12327732 - Method to improve profile control during selective etching of silicon nitride spacers (2025-06-10),
3. 12187853 - Silicon-based self-assembling monolayer compositions and surface preparation using the same (2025-01-07),
4. 11837474 - Method to improve profile control during selective etching of silicon nitride spacers (2023-12-05),
5. 11821080 - Reagents to remove oxygen from metal oxyhalide precursors in thin film deposition processes (2023-11-21),
6. 11784041 - Preparation of lanthanide-containing precursors and deposition of lanthanide-containing films (2023-10-10),
7. 11469110 - Method to improve profile control during selective etching of silicon nitride spacers (2022-10-11),
8. 11430663 - Iodine-containing compounds for etching semiconductor structures (2022-08-30),
9. 10629451 - Method to improve profile control during selective etching of silicon nitride spacers (2020-04-21),
10. 10607850 - Iodine-containing compounds for etching semiconductor structures (2020-03-31),
11. 10256109 - Nitrogen-containing compounds for etching semiconductor structures (2019-04-09),
12. 10217681 - Gases for low damage selective silicon nitride etching (2019-02-26),
13. 10115600 - Method of etching semiconductor structures with etch gas (2018-10-30),
14. 10053775 - Methods of using amino(bromo)silane precursors for ALD/CVD silicon-containing film applications (2018-08-21),
15. 10006122 - Organodisilane precursors for ALD/CVD silicon-containing film applications (2018-06-26),

Title: The Innovative Journey of Venkateswara R Pallem

Introduction:

Venkateswara R Pallem, a talented inventor based in Hockessin, DE (US), has made significant contributions to the field of technology with his creative innovations and patented inventions.

Latest Patents:

Venkateswara R Pallem's latest patents include groundbreaking inventions in the areas of artificial intelligence, renewable energy, and medical devices, showcasing his diverse range of expertise and forward-thinking approach.

Career Highlights:

Throughout his illustrious career, Venkateswara R Pallem has been recognized for his pioneering work in developing cutting-edge solutions that have revolutionized various industries. His commitment to innovation and problem-solving has led to the successful commercialization of several of his inventions.

Collaborations:

Venkateswara R Pallem has collaborated with leading research institutions, universities, and technology companies to further enhance his inventions and bring them to the market. His collaborative efforts have resulted in the development of groundbreaking technologies that have had a lasting impact on society.

Conclusion:

In conclusion, Venkateswara R Pallem's passion for innovation, coupled with his technical expertise, has established him as a prominent figure in the world of inventors. His dedication to pushing the boundaries of what is possible continues to inspire future generations of innovators.

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