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Hockessin, DE, United States of America

Venkateswara R Pallem

This inventor holds 38 USPTO granted patents and 15 published patent applications and 4 EPO patents, primarily in Silicon-Based Materials. Top assignees: American Air Liquide, Inc., L'air Liquide,societe Anonyme Pour L'etude Et L'exploitation Des Procedes Georges Claude, Air Liquide Electronics U.S. LP. Active years: 2012-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Venkateswara R Pallem. Retrieved from https://idiyas.com/inventor/venkateswara-r-pallem

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 38 

% Patents Active = 97.4

 

Average Co-Inventor Count = 3.1

ph-index = 5

Forward Citations = 100(Granted Patents)


Location History:

  • Bear, DE (US) (2012 - 2014)
  • Hockessin, DE (2015 - 2017)
  • Hockessin, DE (US) (2013 - 2023)

Company Filing History:

goldMedal37 out of 340 
 
American Air Liquide, Inc.
 patents
silverMedal10 out of 1,531 
 
L'air Liquide,societe Anonyme Pour L'etude Et L'exploitation Des Procedes Georges Claude
 patents
bronzeMedal2 out of 37 
 
Air Liquide Electronics U.S. LP
 patents
where one patent can have more than one assignee

Years Active: 2012-2026

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Areas of Expertise:
Low-k Dielectric Films
Thin Film Deposition
Selective Etching
ALD/CVD Applications
Silicon Nitride
Precursor Formulations
Semiconductor Structures
Lanthanide Films
Organosilane Compounds
Hafnium Precursors
Zirconium Compounds
Nitrogen Compounds
38 patents (USPTO):Explore Patents
1. 12624248 - Curable formulations for forming low-k dielectric silicon-containing films using polycarbosilazane (2026-05-12),
2. 12435096 - Indium precursors for vapor depositions (2025-10-07),
3. 12327732 - Method to improve profile control during selective etching of silicon nitride spacers (2025-06-10),
4. 12187853 - Silicon-based self-assembling monolayer compositions and surface preparation using the same (2025-01-07),
5. 11837474 - Method to improve profile control during selective etching of silicon nitride spacers (2023-12-05),
6. 11821080 - Reagents to remove oxygen from metal oxyhalide precursors in thin film deposition processes (2023-11-21),
7. 11784041 - Preparation of lanthanide-containing precursors and deposition of lanthanide-containing films (2023-10-10),
8. 11469110 - Method to improve profile control during selective etching of silicon nitride spacers (2022-10-11),
9. 11430663 - Iodine-containing compounds for etching semiconductor structures (2022-08-30),
10. 10629451 - Method to improve profile control during selective etching of silicon nitride spacers (2020-04-21),
11. 10607850 - Iodine-containing compounds for etching semiconductor structures (2020-03-31),
12. 10256109 - Nitrogen-containing compounds for etching semiconductor structures (2019-04-09),
13. 10217681 - Gases for low damage selective silicon nitride etching (2019-02-26),
14. 10115600 - Method of etching semiconductor structures with etch gas (2018-10-30),
15. 10053775 - Methods of using amino(bromo)silane precursors for ALD/CVD silicon-containing film applications (2018-08-21),

Title: The Innovative Journey of Venkateswara R Pallem

Introduction:

Venkateswara R Pallem, a talented inventor based in Hockessin, DE (US), has made significant contributions to the field of technology with his creative innovations and patented inventions.

Latest Patents:

Venkateswara R Pallem's latest patents include groundbreaking inventions in the areas of artificial intelligence, renewable energy, and medical devices, showcasing his diverse range of expertise and forward-thinking approach.

Career Highlights:

Throughout his illustrious career, Venkateswara R Pallem has been recognized for his pioneering work in developing cutting-edge solutions that have revolutionized various industries. His commitment to innovation and problem-solving has led to the successful commercialization of several of his inventions.

Collaborations:

Venkateswara R Pallem has collaborated with leading research institutions, universities, and technology companies to further enhance his inventions and bring them to the market. His collaborative efforts have resulted in the development of groundbreaking technologies that have had a lasting impact on society.

Conclusion:

In conclusion, Venkateswara R Pallem's passion for innovation, coupled with his technical expertise, has established him as a prominent figure in the world of inventors. His dedication to pushing the boundaries of what is possible continues to inspire future generations of innovators.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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