The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 21, 2018
Filed:
Dec. 30, 2015
American Air Liquide, Inc., Fremont, CA (US);
L'air Liquide, Societé Anonyme Pour L'etude ET L'exploitation Des Procédés Georges Claude, Paris, FR;
Glenn Kuchenbeiser, Newark, DE (US);
Venkateswara R. Pallem, Hockessin, DE (US);
Nicolas Blasco, Grenoble, FR;
Jean-Marc Girard, Versailles, FR;
L'Air Liquide, Societé Anonyme pour l'Etude et l'Exploitation des Procédés Georges Claude, Paris, FR;
American Air Liquide, Inc., Fremont, CA (US);
Abstract
Methods of using Si-containing film forming compositions to deposit silicon-containing films using vapor deposition processes are disclosed. The disclosed Si-containing film forming composition comprises an amino(bromo)silane precursor having the formula:SiHBr(NRR)wherein x=0, 1 or 2; y=1, 2 or 3; x+y<4; each Rand Ris independently selected from C-Calkyl, aryl, or hetero group; and Rand Rmay be joined to form a cyclic nitrogen-containing heterocycle. The disclosed Si-containing film forming compositions include an amino(bromo)silane precursor selected from the group consisting of SiHBr(NEt), SiHBr(N(iPr)), SiHBr(N(iBu)) and SiBr(NMe).