Bear, DE, United States of America

Fan Qin

USPTO Granted Patents = 1 

Average Co-Inventor Count = 7.0

ph-index = 1


Company Filing History:


Years Active: 2022

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1 patent (USPTO):Explore Patents

Title: The Innovative Mind of Fan Qin: Pioneering Low-k Dielectric Films

Introduction

Fan Qin, an accomplished inventor based in Bear, Delaware, has made notable strides in the field of materials science. His groundbreaking work has culminated in the development of a patent focused on cureable formulations for creating low-k dielectric silicon-containing films. With one patent to his name, Qin’s contributions to the industry are significant and promising.

Latest Patents

Fan Qin's sole patent, titled "Cureable formulations for forming low-k dielectric silicon-containing films using polycarbosilazane," introduces innovative silicon and carbon-containing film-forming compositions. The patent details a formulation comprising a polycarbosilazane polymer or oligomer that consists of silazane-bridged carbosilane monomers. This unique formulation exhibits at least two -SiH- moieties, positioned either as terminal groups or embedded in a cyclic compound. The patent also elaborates on methods to form silicon and carbon-containing films by utilizing various coating techniques, including spin-on coating, spray coating, dip coating, or slit coating.

Career Highlights

Throughout his career, Fan Qin has worked with several prominent companies. His professional journey includes tenures at L'air Liquide, Société Anonyme Pour L'étude Et L'exploitation Des Procédés Georges Claude, and American Air Liquide, Inc. His experience with these organizations has undoubtedly influenced his innovative practices and research direction.

Collaborations

In the realm of collaboration, Fan Qin has had the opportunity to work alongside talented professionals such as Yumin Liu and Jean-Marc Girard. Their combined efforts in research and development have contributed to advancements in the field of materials science and innovation.

Conclusion

Fan Qin represents a critical force in the development of low-k dielectric materials, with his patented technology paving the way for advancements in electronic devices. His career achievements and collaborative spirit underline the importance of teamwork in fostering innovation. As industries continue to evolve, the impact of inventors like Fan Qin cannot be overstated, and the potential applications of his work will likely propel further innovations in the subject area.

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