Bear, DE, United States of America

Xiangyu Guo

USPTO Granted Patents = 7 

Average Co-Inventor Count = 3.4

ph-index = 1

Forward Citations = 4(Granted Patents)


Company Filing History:


Years Active: 2020-2025

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7 patents (USPTO):Explore Patents

Title: Innovations of Xiangyu Guo

Introduction

Xiangyu Guo is a prominent inventor based in Bear, Delaware, known for her significant contributions to the field of etching methods. With a total of seven patents to her name, she has developed innovative techniques that enhance the precision and efficiency of substrate processing.

Latest Patents

Among her latest patents is a method for forming an aperture pattern in a substrate, which involves a unique combination of non-plasma and plasma etching processes. This method includes exposing the substrate to a vapor of a passivation molecule to create a protective layer, followed by plasma dry etching to form apertures. The process is repeated until the desired pattern is achieved, ensuring that the protective layer is also formed on the sidewalls of the apertures.

Another notable patent focuses on improving profile control during selective etching of silicon nitride spacers. This cyclic etch method involves exposing a silicon nitride layer to a plasma of hydrofluorocarbon to form a polymer layer, which is then removed using an inert gas plasma. This innovative approach allows for the formation of substantially vertically straight silicon nitride spacers.

Career Highlights

Xiangyu Guo is currently employed at American Air Liquide, Inc., where she continues to push the boundaries of etching technology. Her work has been instrumental in advancing the capabilities of substrate processing, making her a valuable asset to her company and the industry.

Collaborations

Throughout her career, Xiangyu has collaborated with talented individuals such as Nathan Stafford and James Royer. These partnerships have fostered a creative environment that has led to the development of groundbreaking technologies.

Conclusion

Xiangyu Guo's innovative work in etching methods has made a significant impact on the field of substrate processing. Her patents reflect her dedication to advancing technology and improving manufacturing processes.

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