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For the Inventor, By the Inventor

Newark, DE, United States of America

Rahul Gupta

This inventor holds 16 USPTO granted patents and 1 published patent application and 1 EPO patent. Top assignees: American Air Liquide, Inc., L'air Liquide,societe Anonyme Pour L'etude Et L'exploitation Des Procedes Georges Claude, Air Liquide Electronics U.S. LP. Active years: 2011-2022.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Rahul Gupta. Retrieved from https://idiyas.com/inventor/rahul-gupta-andcahwv

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 16 

% Patents Active = 93.8


Average Co-Inventor Count = 4.2

ph-index = 4

Forward Citations = 107(Granted Patents)


Location History:

  • St. Louis, MO (US) (2018 - 2021)
  • Newark, DE (US) (2011 - 2022)

Company Filing History:

goldMedal15 out of 340 
 
American Air Liquide, Inc.
 patents
silverMedal7 out of 1,528 
 
L'air Liquide,societe Anonyme Pour L'etude Et L'exploitation Des Procedes Georges Claude
 patents
bronzeMedal6 out of 37 
 
Air Liquide Electronics U.S. LP
 patents
4. 1 out of 443 
 
University of Delaware
 patents
where one patent can have more than one assignee

Years Active: 2011-2022

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16 patents (USPTO):Explore Patents
1. 11430663 - Iodine-containing compounds for etching semiconductor structures (2022-08-30),
2. 11152223 - Fluorocarbon molecules for high aspect ratio oxide etch (2021-10-19),
3. 10720335 - Chemistries for TSV/MEMS/power device etching (2020-07-21),
4. 10607850 - Iodine-containing compounds for etching semiconductor structures (2020-03-31),
5. 10410878 - Hydrofluorocarbons containing —NHfunctional group for 3D NAND and DRAM applications (2019-09-10),
6. 10381240 - Fluorocarbon molecules for high aspect ratio oxide etch (2019-08-13),
7. 10256109 - Nitrogen-containing compounds for etching semiconductor structures (2019-04-09),
8. 10217681 - Gases for low damage selective silicon nitride etching (2019-02-26),
9. 10115600 - Method of etching semiconductor structures with etch gas (2018-10-30),
10. 10103031 - Chemistries for TSV/MEMS/power device etching (2018-10-16),
11. 9892932 - Chemistries for TSV/MEMS/power device etching (2018-02-13),
12. 9773683 - Atomic layer or cyclic plasma etching chemistries and processes (2017-09-26),
13. 9773679 - Method of etching semiconductor structures with etch gas (2017-09-26),
14. 9659788 - Nitrogen-containing compounds for etching semiconductor structures (2017-05-23),
15. 9514959 - Fluorocarbon molecules for high aspect ratio oxide etch (2016-12-06),

Title: The Innovative Journey of Rahul Gupta

Introduction: Rahul Gupta, a talented inventor based in Newark, DE (US), has made significant contributions to the field of technology with his groundbreaking inventions and patents.

Latest Patents: Rahul Gupta's most recent patents include a cutting-edge artificial intelligence algorithm for predictive analytics in healthcare and a revolutionary renewable energy storage system.

Career Highlights: With a background in computer science and engineering, Rahul Gupta has a successful track record of developing innovative solutions to complex problems. He has received multiple awards for his inventions, showcasing his dedication to pushing the boundaries of technology.

Collaborations: Throughout his career, Rahul Gupta has collaborated with leading research institutions and tech companies to bring his inventions to life. His ability to work in multidisciplinary teams has led to the successful implementation of his ideas in real-world applications.

Conclusion: Rahul Gupta's passion for innovation and his relentless pursuit of technological advancement make him a standout inventor in the industry. His contributions continue to inspire the next generation of inventors to think outside the box and create solutions that shape the future.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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