The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 21, 2026
Filed:
Mar. 16, 2024
L'air Liquide, Societe Anonyme Pour L'etude ET L'exploitation Des Procedes Georges Claude, Paris, FR;
Bradley Mckeown, Newark, DE (US);
Kayla Diemoz, Newark, DE (US);
American Air Liquide, Inc., Newark, DE (US);
Abstract
A method for forming a Group (III)-containing film on a substrate comprises exposing the substrate to a vapor of a Group (III)-containing film-forming composition that contains a Group (III)-containing precursor and depositing at least part of the Group (III)-containing precursor onto the substrate to form the Group (III)-containing film on the substrate through a vapor deposition process. The Group (III)-containing precursor contains at least one fluorocarbon group on at least one of ancillary ligands. The Group (III)-containing precursor is tris(2-(dimethylamino)methyl-1,1,1,3,3,3-hexafluoropropan-2-ol)indium, represented as (F-dmamp)In.