Newark, DE, United States of America

Bradley Mckeown

This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: American Air Liquide, Inc.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Bradley Mckeown. Retrieved from https://idiyas.com/inventor/bradley-mckeown-ocbqk6rd

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 1 

Average Co-Inventor Count = 1.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Bradley Mckeown: Inventor in Vapor Deposition

Introduction

Bradley Mckeown is an inventor associated with Newark, Delaware, and American Air Liquide, Inc. His patent work concerns fluorinated Group III precursors for forming films through vapor deposition.

Latest Patents

Mckeown is named on one patent, titled “Fluorination of Ancillary Ligands of Group (III) Precursors and Their Applications in Vapor Depositions.” The invention describes forming a Group III-containing film by exposing a substrate to a vapor containing a Group III precursor and depositing at least part of that precursor onto the substrate. The precursor includes a fluorocarbon group on at least one ancillary ligand; one specified example is tris(2-(dimethylamino)methyl-1,1,1,3,3,3-hexafluoropropan-2-ol)indium, represented as (F-dmamp)In. Mckeown’s record lists 1 patent.

Career Highlights

Mckeown’s listed affiliation is American Air Liquide, Inc. The patent reflects work on precursor chemistry and vapor-deposition processes for producing Group III-containing films.

Collaborations

Kayla Diemoz is identified as Mckeown’s coworker. The available information does not specify her role in the patent or the nature of their collaboration.

Conclusion

Bradley Mckeown’s listed invention focuses on fluorinated Group III precursors and their use in vapor deposition, connecting his patent record with materials and film-forming technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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