This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: American Air Liquide, Inc.. Active years: 2026.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2026
Title: Bradley Mckeown: Inventor in Vapor Deposition
Introduction
Bradley Mckeown is an inventor associated with Newark, Delaware, and American Air Liquide, Inc. His patent work concerns fluorinated Group III precursors for forming films through vapor deposition.
Latest Patents
Mckeown is named on one patent, titled “Fluorination of Ancillary Ligands of Group (III) Precursors and Their Applications in Vapor Depositions.” The invention describes forming a Group III-containing film by exposing a substrate to a vapor containing a Group III precursor and depositing at least part of that precursor onto the substrate. The precursor includes a fluorocarbon group on at least one ancillary ligand; one specified example is tris(2-(dimethylamino)methyl-1,1,1,3,3,3-hexafluoropropan-2-ol)indium, represented as (F-dmamp)In. Mckeown’s record lists 1 patent.
Career Highlights
Mckeown’s listed affiliation is American Air Liquide, Inc. The patent reflects work on precursor chemistry and vapor-deposition processes for producing Group III-containing films.
Collaborations
Kayla Diemoz is identified as Mckeown’s coworker. The available information does not specify her role in the patent or the nature of their collaboration.
Conclusion
Bradley Mckeown’s listed invention focuses on fluorinated Group III precursors and their use in vapor deposition, connecting his patent record with materials and film-forming technology.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
