The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 27, 2025

Filed:

Jul. 02, 2021
Applicants:

L'air Liquide, Société Anonyme Pour I'etude ET I'exploitation Des Procédés Georges Claude, Paris, FR;

American Air Liquide, Inc.;

Inventors:

Jan Mante, Muenster, DE;

Vasuhi Rasanayagam, New Delhi, IN;

Midhun Joy, Bear, DE (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C02F 1/78 (2023.01); B01F 23/10 (2022.01); B01F 23/23 (2022.01); B01F 23/237 (2022.01); C02F 1/20 (2023.01);
U.S. Cl.
CPC ...
C02F 1/78 (2013.01); B01F 23/19 (2022.01); B01F 23/23 (2022.01); B01F 23/237612 (2022.01); B01F 23/237613 (2022.01); C02F 1/20 (2013.01); C02F 2209/001 (2013.01); C02F 2209/003 (2013.01); C02F 2209/03 (2013.01); C02F 2209/40 (2013.01);
Abstract

Disclosed are systems and methods for mixing a gas-free liquid oxidant with a process liquid to form a homogeneous and gas-free mixture with minimized degassing. The mixing system comprises an injection device, integrating with a pipe through which a process liquid flows, configured and adapted to inject a gas-free liquid oxidant into the process liquid, and a mixer, fluidly connected to the pipe and the injection device, configured and adapted to mix the process liquid and the gas-free liquid oxidant therein to form a homogeneous and gas-free mixture of the process liquid and the gas-free liquid oxidant with minimal degassing. The method comprises the steps of a) injecting the gas-free liquid oxidant into the process liquid, and b) mixing the gas-free liquid oxidant and the process liquid to form the homogeneous and gas-free mixture. The gas-free liquid oxidant is ozone strong water.


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