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For the Inventor, By the Inventor

San Jose, CA, United States of America

Zhiyuan Ye

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This inventor holds 84 USPTO granted patents and 33 published patent applications and 3 EPO patents, primarily in Epitaxial Deposition (CPC class H01L21-67115). Top assignees: Applied Materials, Inc., Applied Material, Inc.. Active years: 2010-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Zhiyuan Ye. Retrieved from https://idiyas.com/inventor/zhiyuan-ye

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 84 

% Patents Active = 85.7

 

Average Co-Inventor Count = 4.4

ph-index = 8

Forward Citations = 392(Granted Patents)

Forward Citations (Not Self Cited) = 348(Dec 10, 2025)


Inventors with similar research interests:


Location History:

  • Cupertino, CA (US) (2010 - 2023)
  • San Jose, CA (US) (2010 - 2024)

Company Filing History:

goldMedal83 out of 14,454 
 
Applied Materials, Inc.
 patents
silverMedal1 out of 23 
 
Applied Material, Inc.
 patents

Years Active: 2010-2026

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Areas of Expertise:
Epitaxial Deposition
Thermal Processing
Gas Flow Control
Substrate Processing
Temperature Control
Optical Emission Spectroscopy
Transistor Engineering
Mass Flow Verification
Wafer Heating
EPI Chamber
Crystal Thickness Control
Multi-Zone Heating
84 patents (USPTO):Explore Patents
1. 12707921 - Methods and assemblies for gas flow ratio control (2026-08-11),
2. 12681221 - Axisymmetric heating assembly layout with double ended lamp (2026-07-14),
3. 12584240 - Low mass substrate support (2026-03-24),
4. 12449309 - Methods for detection using optical emission spectroscopy (2025-10-21),
5. 12400904 - Thermal processing susceptor (2025-08-26),
6. 12385159 - In-situ epi growth rate control of crystal thickness micro-balancing sensor (2025-08-12),
7. 12371776 - Overlap susceptor and preheat ring (2025-07-29),
8. 12341038 - Dynamic and localized temperature control for epitaxial deposition reactors (2025-06-24),
9. 12324061 - Epitaxial deposition chamber (2025-06-03),
10. 12261062 - Spot heating by moving a beam with horizontal rotary motion (2025-03-25),
11. 12249626 - Arsenic diffusion profile engineering for transistors (2025-03-11),
12. 12196617 - Temperature profile measurement and synchronized control on substrate and susceptor in an epitaxy chamber (2025-01-14),
13. 12188148 - Multi-layer EPI chamber body (2025-01-07),
14. 12183606 - Methods and assemblies for gas flow ratio control (2024-12-31),
15. 12165934 - Substrate processing monitoring (2024-12-10),

Title: Unveiling the Innovation Journey of Zhiyuan Ye

Introduction:

Zhiyuan Ye, a prolific inventor based in San Jose, CA, has left a significant mark in the realm of technological advancements with his groundbreaking inventions and numerous patents.

Latest Patents:

Among his remarkable recent patents, Zhiyuan Ye has delved into the realm of gas flow ratio control with innovative methods and assemblies that optimize process gas flow and carrier gas flow through mass flow controllers and back pressure controllers.

Moreover, his thermal processing susceptor invention showcases his prowess in creating cutting-edge solutions to enhance thermal processing procedures, featuring unique structures that reduce the contacting surface area between substrates and the susceptor.

Career Highlights:

Zhiyuan Ye's professional journey flourishes at Applied Materials, Inc., a renowned company at the forefront of pioneering technologies in the semiconductor and nanotechnology industries.

Collaborations:

Within Applied Materials, Zhiyuan Ye collaborates with esteemed colleagues such as Yihwan Kim and Errol Antonio C Sanchez, fostering a dynamic and innovative work environment where ideas flourish and inventions come to life.

Conclusion:

In conclusion, Zhiyuan Ye stands as a testament to the power of innovation and ingenuity, revolutionizing industries and pushing the boundaries of what is possible in the world of technology. His dedication to creating impactful solutions underscores his position as a visionary inventor shaping the future of technological advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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