The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 21, 2025
Filed:
Jul. 08, 2020
Applied Materials, Inc., Santa Clara, CA (US);
Zuoming Zhu, Sunnyvale, CA (US);
Martin A. Hilkene, Gilroy, CA (US);
Avinash Shervegar, Karnataka, IN;
Surendra Singh Srivastava, Santa Clara, CA (US);
Ala Moradian, Sunnyvale, CA (US);
Shu-Kwan Lau, Sunnyvale, CA (US);
Zhiyuan Ye, San Jose, CA (US);
Enle Choo, Saratoga, CA (US);
Flora Fong-Song Chang, Saratoga, CA (US);
Bindusagar Marath Sankarathodi, San Jose, CA (US);
Patricia M. Liu, Saratoga, CA (US);
Errol Antonio C. Sanchez, Tracy, CA (US);
Jenny Lin, Saratoga, CA (US);
Nyi O. Myo, San Jose, CA (US);
Schubert S. Chu, San Francisco, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
Methods for detection using optical emission spectroscopy in which an optical signal is delivered from the process chamber to an optical emission spectrometer (OES). The OES identifies emission peaks of photons, which corresponds to the optical intensity of radiation from the photons, to determine the concentrations of each of the precursor gases and reaction products. The OES sends input signals of the data results to a controller. The controller can adjust process variables within the process chamber in real time during deposition based on the comparison. In other embodiments, the controller can automatically trigger a process chamber clean based on a comparison of input signals of process chamber residues received before the deposition process and input signals of process chamber residues received after the deposition process.