The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 24, 2025
Filed:
Jan. 11, 2022
Applicant:
Applied Materials, Inc., Santa Clara, CA (US);
Inventors:
Sathya Shrinivas Chary, San Francisco, CA (US);
Zhiyuan Ye, San Jose, CA (US);
Assignee:
Applied Materials, Inc., Santa Clara, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
F27B 17/00 (2006.01); F27D 3/00 (2006.01); F27D 5/00 (2006.01); H01L 21/66 (2006.01); H01L 21/67 (2006.01); H05B 1/02 (2006.01); H05B 3/00 (2006.01);
U.S. Cl.
CPC ...
H01L 21/67248 (2013.01); F27B 17/0025 (2013.01); F27D 3/0084 (2013.01); F27D 5/0037 (2013.01); H01L 22/26 (2013.01); H05B 1/0233 (2013.01); H05B 3/0047 (2013.01);
Abstract
A method and apparatus for improving film growth uniformity on a semiconductor substrate. The film growth uniformity is improved by adjusting the amount of power provided to the substrate by spot heaters as the substrate is rotated. Therefore, the amount of power provided to the substrate by the spot heaters changes as the portion of the substrate being heated by spot heater changes. The change in power provided by the spot heater is dependent on a temperature correction factor applied by the controller.