The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 11, 2026

Filed:

Nov. 08, 2024
Applicant:

Applied Materials, Inc., Santa Clara, CA (US);

Inventors:

Kevin Brashear, San Jose, CA (US);

Ashley M. Okada, San Jose, CA (US);

Dennis L. Demars, Santa Clara, CA (US);

Zhiyuan Ye, San Jose, CA (US);

Jaidev Rajaram, Bangalore, IN;

Marcel E. Josephson, San Jose, CA (US);

Assignee:

Applied Materials, Inc., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/455 (2006.01); G05D 11/13 (2006.01); H10P 72/00 (2026.01);
U.S. Cl.
CPC ...
H10P 72/0604 (2026.01); G05D 11/132 (2013.01); H10P 72/0402 (2026.01);
Abstract

A master controller identifies a flow ratio setpoint for at least one of a process gas or a carrier gas flow to a process chamber through a set of mass flow controllers. The master controller determines an amount of gas loss within the system due to the abatement sub-system. The master controller determines a flow setpoint for the at least one of the process gas flow or the carrier gas flow through each of the set of mass flow controllers based on the identified flow ratio setpoint and the determined amount of gas loss. The master controller controls the at least one of the process gas flow or the carrier gas flow through each of the set of mass flow controllers according to the determined flow setpoint for each of the set of mass flow controllers.


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