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Yihong Chen

This inventor holds 39 USPTO granted patents and 9 published patent applications, primarily in Atomic Layer Deposition. Top assignee: Applied Materials, Inc.. Active years: 2016-2025.

USPTO Granted Patents = 39 (Patent Applications = 9)

% Patents Active = 82.1

Average Co-Inventor Count = 4.6

ph-index = 6

Forward Citations = 109(Granted Patents)

Company Filing History:

39 out of 14,391

Applied Materials, Inc.

patents

Years Active: 2016-2025

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Areas of Expertise:

Atomic Layer Deposition

Tungsten Deposition

Ultra-Thin Barriers

Amorphous Silicon

Nucleation Layers

3D-NAND Devices

Seam Healing

Conformal Films

Metal Silicide

Self-Aligned Vias

Hydrosilylation Passivation

Dielectric Films

39 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 12394670 - Nucleation-free gap fill ALD process (2025-08-19),

2. 12325910 - Deposition of conformal and gap-fill amorphous silicon thin-films (2025-06-10),

3. 11887856 - Enhanced spatial ALD of metals through controlled precursor mixing (2024-01-30),

4. 11702742 - Methods of forming nucleation layers with halogenated silanes (2023-07-18),

5. 11289374 - Nucleation-free gap fill ALD process (2022-03-29),

6. 11244824 - Conformal doped amorphous silicon as nucleation layer for metal deposition (2022-02-08),

7. 11174551 - Methods for depositing tungsten on halosilane based metal silicide nucleation layers (2021-11-16),

8. 11094544 - Methods of forming self-aligned vias (2021-08-17),

9. 11069568 - Ultra-thin diffusion barriers (2021-07-20),

10. 11066743 - Selective atomic layer deposition of ruthenium (2021-07-20),

11. 11043386 - Enhanced spatial ALD of metals through controlled precursor mixing (2021-06-22),

12. 10886172 - Methods for wordline separation in 3D-NAND devices (2021-01-05),

13. 10854511 - Methods of lowering wordline resistance (2020-12-01),

14. 10854461 - Tungsten deposition without barrier layer (2020-12-01),

15. 10790141 - Surface-selective atomic layer deposition using hydrosilylation passivation (2020-09-29),

Certainly! Here is the article about inventor Yihong Chen:

Title: Spotlight on Inventor Yihong Chen from San Jose, CA

Introduction: Yihong Chen, a prolific inventor based in San Jose, CA, has made significant contributions to the field of atomic layer deposition (ALD) with a total of 37 patents to his name.

Latest Patents: Yihong Chen's latest patents showcase his expertise in the development of advanced ALD techniques. One notable patent is "Enhanced spatial ALD of metals through controlled precursor mixing," where methods for depositing films by ALD are detailed. Another patent, "Methods of forming nucleation layers with halogenated silanes," highlights his innovative approaches to substrate processing.

Career Highlights: Yihong Chen is a valuable asset to Applied Materials, Inc., a leading company in the semiconductor industry. His expertise in ALD technologies has significantly impacted the company's research and development efforts, leading to groundbreaking innovations in thin film deposition.

Collaborations: Yihong Chen has collaborated closely with renowned experts in the field, including Abhijit Basu Mallick and Srinivas Gandikota. Together, they have worked on cutting-edge projects that have pushed the boundaries of ALD technology.

Conclusion: In conclusion, Yihong Chen's remarkable career as an inventor at Applied Materials, Inc. is marked by his dedication to advancing ALD methodologies. His series of patents and collaborations underscore his innovative spirit and commitment to driving technological advancements in the semiconductor industry.

I hope you find this article about inventor Yihong Chen informative and engaging! If you have any more requests or need further information, feel free to ask.

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