IDiyas

For the Inventor, By the Inventor

San Jose, CA, United States of America

Yihong Chen

LinkedIn
USPTO Granted Patents = 39 

Average Co-Inventor Count = 4.6

ph-index = 6

Forward Citations = 106(Granted Patents)


Company Filing History:

goldMedal39 out of 13,684 
 
Applied Materials, Inc.
 patents

Years Active: 2016-2025

where 'Filed Patents' based on already Granted Patents

39 patents (USPTO):
1. 12394670 - Nucleation-free gap fill ALD process (2025-08-19),
2. 12325910 - Deposition of conformal and gap-fill amorphous silicon thin-films (2025-06-10),
3. 11887856 - Enhanced spatial ALD of metals through controlled precursor mixing (2024-01-30),
4. 11702742 - Methods of forming nucleation layers with halogenated silanes (2023-07-18),
5. 11289374 - Nucleation-free gap fill ALD process (2022-03-29),
6. 11244824 - Conformal doped amorphous silicon as nucleation layer for metal deposition (2022-02-08),
7. 11174551 - Methods for depositing tungsten on halosilane based metal silicide nucleation layers (2021-11-16),
8. 11094544 - Methods of forming self-aligned vias (2021-08-17),
9. 11069568 - Ultra-thin diffusion barriers (2021-07-20),
10. 11066743 - Selective atomic layer deposition of ruthenium (2021-07-20),
11. 11043386 - Enhanced spatial ALD of metals through controlled precursor mixing (2021-06-22),
12. 10886172 - Methods for wordline separation in 3D-NAND devices (2021-01-05),
13. 10854511 - Methods of lowering wordline resistance (2020-12-01),
14. 10854461 - Tungsten deposition without barrier layer (2020-12-01),
15. 10790141 - Surface-selective atomic layer deposition using hydrosilylation passivation (2020-09-29),

Certainly! Here is the article about inventor Yihong Chen:

Title: Spotlight on Inventor Yihong Chen from San Jose, CA

Introduction: Yihong Chen, a prolific inventor based in San Jose, CA, has made significant contributions to the field of atomic layer deposition (ALD) with a total of 37 patents to his name.

Latest Patents: Yihong Chen's latest patents showcase his expertise in the development of advanced ALD techniques. One notable patent is "Enhanced spatial ALD of metals through controlled precursor mixing," where methods for depositing films by ALD are detailed. Another patent, "Methods of forming nucleation layers with halogenated silanes," highlights his innovative approaches to substrate processing.

Career Highlights: Yihong Chen is a valuable asset to Applied Materials, Inc., a leading company in the semiconductor industry. His expertise in ALD technologies has significantly impacted the company's research and development efforts, leading to groundbreaking innovations in thin film deposition.

Collaborations: Yihong Chen has collaborated closely with renowned experts in the field, including Abhijit Basu Mallick and Srinivas Gandikota. Together, they have worked on cutting-edge projects that have pushed the boundaries of ALD technology.

Conclusion: In conclusion, Yihong Chen's remarkable career as an inventor at Applied Materials, Inc. is marked by his dedication to advancing ALD methodologies. His series of patents and collaborations underscore his innovative spirit and commitment to driving technological advancements in the semiconductor industry.

I hope you find this article about inventor Yihong Chen informative and engaging! If you have any more requests or need further information, feel free to ask.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…