The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 18, 2023
Filed:
Nov. 15, 2021
Applicant:
Applied Materials, Inc., Santa Clara, CA (US);
Inventors:
Kelvin Chan, San Ramon, CA (US);
Yihong Chen, San Jose, CA (US);
Assignee:
Applied Materials, Inc., Santa Clara, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/455 (2006.01); C23C 16/08 (2006.01); C23C 16/02 (2006.01); C23C 16/42 (2006.01);
U.S. Cl.
CPC ...
C23C 16/45527 (2013.01); C23C 16/0272 (2013.01); C23C 16/08 (2013.01); C23C 16/42 (2013.01); C23C 16/45551 (2013.01);
Abstract
Methods for forming a nucleation layer on a substrate. In some embodiments, the processing method comprises sequential exposure to a first reactive gas comprising a metal precursor and a second reactive gas comprising a halogenated silane to form a nucleation layer on the surface of the substrate.