The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 29, 2020
Filed:
Sep. 15, 2016
Applicant:
Applied Materials, Inc., Santa Clara, CA (US);
Inventors:
Kelvin Chan, San Ramon, CA (US);
Yihong Chen, San Jose, CA (US);
Abhijit Basu Mallick, Palo Alto, CA (US);
Assignee:
APPLIED MATERIALS, INC., Santa Clara, CA (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/02 (2006.01); C23C 16/04 (2006.01); C23C 16/34 (2006.01); H01L 21/285 (2006.01); H01L 21/306 (2006.01); H01L 21/768 (2006.01); C23C 16/455 (2006.01); H01L 21/32 (2006.01);
U.S. Cl.
CPC ...
H01L 21/0228 (2013.01); C23C 16/04 (2013.01); C23C 16/345 (2013.01); C23C 16/45525 (2013.01); C23C 16/45536 (2013.01); H01L 21/0217 (2013.01); H01L 21/02186 (2013.01); H01L 21/02271 (2013.01); H01L 21/28562 (2013.01); H01L 21/306 (2013.01); H01L 21/32 (2013.01); H01L 21/76826 (2013.01); H01L 21/76829 (2013.01);
Abstract
Methods for selectively depositing films by atomic layer deposition are disclosed. Substrate surfaces are passivated by hydrosilylation to prevent deposition and allow selective deposition on unpassivated surfaces.