Abiko, Japan

Yasuhiko Ozawa

This inventor holds 24 USPTO granted patents and 1 published patent application and 2 EPO patents, primarily in Semiconductor Inspection. Top assignees: Hitachi, Ltd., Hitachi-High-Technologies Corporation. Active years: 1989-2014.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Yasuhiko Ozawa. Retrieved from https://idiyas.com/inventor/yasuhiko-ozawa

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 24 

% Patents Active = 79.2


Average Co-Inventor Count = 5.0

ph-index = 9

Forward Citations = 257(Granted Patents)


Location History:

  • Katsuta, JP (1989)
  • Tokyo, JP (2004 - 2008)
  • Abiko, JP (2002 - 2014)

Company Filing History:


Years Active: 1989-2014

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Areas of Expertise:
Scanning Electron Microscope
Charged Particle Beam
Semiconductor Inspection
Defect Inspection
Quality Determination
Circuit Pattern Analysis
Defect Classification
Depression Protrusion Measurement
Electronic Device Manufacturing
Inspection Method
Inspection System
24 patents (USPTO):Explore Patents

Title: Innovations of Yasuhiko Ozawa: A Trailblazer in Electron Microscopy

Introduction

Yasuhiko Ozawa, an esteemed inventor based in Abiko, Japan, has made significant contributions to the field of electron microscopy with a remarkable portfolio of 24 patents. His work has not only advanced technological capabilities but also enhanced precision in inspection methods, particularly in the manufacturing of electronic devices.

Latest Patents

Ozawa's latest innovations include a state-of-the-art scanning electron microscope designed to streamline the inspection process. This invention aims to reduce the complexities associated with inspection positioning and input operations, achieving high precision at remarkable speeds. The microscope incorporates a pattern recognition function, allowing it to identify desired positions based on pre-registered information. It utilizes a sophisticated means of setting parameters regarding the pattern type, spacing between parts, and their sizes, and generates a composite imaging pattern accordingly.

Another groundbreaking patent involves an inspection method and system for manufacturing electronic devices. This method classifies defects by calculating feature quantities from defect images captured on samples. The classified images are then organized into categories, displayed accordingly on a screen, and supplemented with additional information to enhance clarity. This innovation significantly aids in the identification and resolution of manufacturing defects, streamlining the production process.

Career Highlights

Yasuhiko Ozawa has worked with prestigious organizations such as Hitachi, Ltd. and Hitachi High-Technologies Corporation. His respectable tenure at these companies has allowed him to refine his expertise and push the boundaries in electron microscopy and related fields.

Collaborations

During his career, Ozawa has collaborated with renowned professionals including Satoru Yamaguchi and Atsushi Takane. These partnerships have fostered an environment of innovation and contributed to the development of important technological advancements.

Conclusion

Yasuhiko Ozawa stands out as a prolific inventor whose contributions have significantly impacted the domain of microscopy and inspection technologies. His continuous pursuit of innovation is evident in his extensive patent portfolio, demonstrating his commitment to enhancing precision and efficiency in electronic device manufacturing. Through his work, Ozawa not only showcases the power of ingenuity but also inspires future generations of inventors in the scientific community.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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