The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 11, 2006
Filed:
Feb. 13, 2003
Atsushi Takane, Mito, JP;
Haruo Yoda, Hinode, JP;
Shoji Yoshida, Hitachi, JP;
Mitsuji Ikeda, Hitachinaka, JP;
Yasuhiko Ozawa, Abiko, JP;
Atsushi Takane, Mito, JP;
Haruo Yoda, Hinode, JP;
Shoji Yoshida, Hitachi, JP;
Mitsuji Ikeda, Hitachinaka, JP;
Yasuhiko Ozawa, Abiko, JP;
Hitachi, Ltd., Tokyo, JP;
Abstract
An operator-free and fully automated semiconductor inspection system with high throughput is realized. All conditions required for capturing and inspection are generated from design information such as CAD data. In order to perform actual inspection under the conditions, a semiconductor inspection system is composed of a navigation system for generating all the conditions required for capturing and inspection from the design information and a scanning electron microscope system for actually performing capturing and inspection. Moreover, in the case of performing a matching process between designed data and a SEM image, deformed parts are corrected by use of edge information in accordance with multiple directions and smoothing thereof. Furthermore, a SEM image corresponding to a detected position is re-registered as a template, and the matching process is thereby performed.