Hitachinaka, Japan

Mitsuji Ikeda

USPTO Granted Patents = 39 

Average Co-Inventor Count = 3.9

ph-index = 9

Forward Citations = 380(Granted Patents)


Location History:

  • Katsuta, JP (1994 - 1995)
  • Hitachinaka, JP (2001 - 2020)
  • Tokyo, JP (2004 - 2023)

Company Filing History:


Years Active: 1994-2025

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39 patents (USPTO):

Title: The Innovative Mind of Mitsuji Ikeda: Revolutionizing Semiconductor Inspection

Introduction:

Mitsuji Ikeda, a prolific inventor hailing from Hitachinaka, Japan, is a visionary in the realm of pattern matching devices and semiconductor inspection apparatus. With an impressive portfolio of 38 patents, Ikeda is dedicated to enhancing accuracy and efficiency in technological processes.

Latest Patents:

Ikeda's recent patents showcase his commitment to advancing pattern matching technology. The "Pattern matching device and computer program for pattern matching" aims to improve positioning accuracy even in scenarios with changing edge positions and numbers. Similarly, the "Pattern matching apparatus and computer program" focuses on semiconductor inspection, streamlining position alignment processes without the need for manual intervention.

Career Highlights:

Throughout his career, Ikeda has made significant contributions to companies such as Hitachi High-Technologies Corporation and Hitachi, Ltd. His expertise in semiconductor technology and pattern matching has led to groundbreaking innovations that are shaping the future of the industry.

Collaborations:

Ikeda has collaborated with notable professionals in the field, including Atsushi Takane and Yuichi Abe. Together, they have worked towards refining semiconductor inspection processes and developing cutting-edge solutions for complex technological challenges.

Conclusion:

Mitsuji Ikeda's inventive spirit and dedication to technological excellence have established him as a pioneering force in the world of pattern matching devices and semiconductor inspection. His innovative patents and collaborative efforts underscore his profound impact on advancing industry standards and driving innovation forward.

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