The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 10, 2015

Filed:

Oct. 02, 2009
Applicants:

Yoshimichi Sato, Hitachi, JP;

Mitsuji Ikeda, Hitachinaka, JP;

Fumihiro Sasajima, Hitachinaka, JP;

Inventors:

Yoshimichi Sato, Hitachi, JP;

Mitsuji Ikeda, Hitachinaka, JP;

Fumihiro Sasajima, Hitachinaka, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G06K 9/00 (2006.01); G06K 9/62 (2006.01); H01J 37/28 (2006.01); G06T 7/00 (2006.01); H01J 37/22 (2006.01);
U.S. Cl.
CPC ...
H01J 37/28 (2013.01); G06K 9/00127 (2013.01); G06T 7/0044 (2013.01); H01J 37/222 (2013.01); G06K 2209/403 (2013.01); G06T 2207/10061 (2013.01); G06T 2207/30148 (2013.01); H01J 2237/24592 (2013.01);
Abstract

A pattern matching method for a scanning electron microscope comprises a step of performing pattern matching of only an upper layer pattern between an image () in which a pattern consisting of plural layers is represented and a template () in which the upper layer pattern of the plural layer pattern is selectively represented, thereby identifying the position of the pattern consisting of the plural layers. Then, information about the upper layer pattern is subtracted from the image (), thus extracting shape information () about the lower layer pattern. Consequently, stable positioning or selective information extraction on a certain layer is enabled regardless of the state of the depths of a pattern formed in three dimensions or of the charge state of a sample.


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