The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 20, 2009
Filed:
Dec. 15, 2003
Mitsugu Sato, Hitachinaka, JP;
Tadashi Otaka, Hitachinaka, JP;
Makoto Ezumi, Mito, JP;
Atsushi Takane, Mito, JP;
Shoji Yoshida, Hitachi, JP;
Satoru Yamaguchi, Hitachinaka, JP;
Yasuhiko Ozawa, Abiko, JP;
Mitsugu Sato, Hitachinaka, JP;
Tadashi Otaka, Hitachinaka, JP;
Makoto Ezumi, Mito, JP;
Atsushi Takane, Mito, JP;
Shoji Yoshida, Hitachi, JP;
Satoru Yamaguchi, Hitachinaka, JP;
Yasuhiko Ozawa, Abiko, JP;
Hitachi, Ltd., Tokyo, JP;
Abstract
An object of the present invention is to provide a charged particle beam apparatus and an alignment method of the charged particle beam apparatus, which make it possible to align an optical axis of a charged particle beam easily even when a state of the charged particle beam changes. The present invention comprises calculation means for calculating a deflection amount of an alignment deflector which performs an axis alignment for an objective lens, a plurality of calculation methods for calculating the deflection amount is memorized in the calculation means, and a selection means for selecting at least one of the calculation methods is provided.