The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 23, 2007
Filed:
Feb. 14, 2005
Atsushi Takane, Mito, JP;
Satoru Yamaguchi, Hitachinaka, JP;
Osamu Komuro, Hitachinaka, JP;
Yasuhiko Ozawa, Abiko, JP;
Hideo Todokoro, Hinode, JP;
Atsushi Takane, Mito, JP;
Satoru Yamaguchi, Hitachinaka, JP;
Osamu Komuro, Hitachinaka, JP;
Yasuhiko Ozawa, Abiko, JP;
Hideo Todokoro, Hinode, JP;
Hitachi, Ltd., Tokyo, JP;
Abstract
A method for determining a depression/protrusion, especially of a line and space pattern formed on a sample, and an apparatus therefor. A charged particle beam is scanned with its direction being inclined to the original optical axis of the charged particle beam or a sample stage is inclined, broadening of a detected signal in a line scanning direction of the charged particle beam is measured, the broadening is compared with that when the charged particle beam is scanned with its direction being parallel to the original optical axis of the charged particle beam, and a depression/protrusion of the scanned portion is determined on the basis of increase/decrease of the broadening.