The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 11, 2012
Filed:
Dec. 31, 2009
Applicants:
Atsushi Takane, Mito, JP;
Mitsuji Ikeda, Hitachinaka, JP;
Satoru Yamaguchi, Hitachinaka, JP;
Yasuhiko Ozawa, Abiko, JP;
Inventors:
Atsushi Takane, Mito, JP;
Mitsuji Ikeda, Hitachinaka, JP;
Satoru Yamaguchi, Hitachinaka, JP;
Yasuhiko Ozawa, Abiko, JP;
Assignee:
Hitachi High-Technologies Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01N 23/00 (2006.01); G21K 7/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
A charged particle beam apparatus for obtaining information of an uneven surface or a depression/protrusion of a sample by irradiating a charged particle beam to a sample having an uneven surface or a depression/protrusion at a plurality of focal positions, measuring signal emitted from the sample, and comparing profile waveforms corresponding to edge portions of the uneven surface.