Waterbury, CT, United States of America

William Hunks

USPTO Granted Patents = 21 

 

Average Co-Inventor Count = 5.7

ph-index = 8

Forward Citations = 552(Granted Patents)


Location History:

  • Danbury, CT (US) (2018 - 2020)
  • Waterbury, CT (US) (2010 - 2022)

Company Filing History:


Years Active: 2010-2022

where 'Filed Patents' based on already Granted Patents

21 patents (USPTO):

Title: William Hunks: Innovations in Advanced Materials Deposition

Introduction:

William Hunks, a brilliant inventor and researcher based in Waterbury, CT, has made significant contributions to the field of advanced materials deposition. With a strong background in chemistry and engineering, Hunks has obtained a remarkable portfolio of 21 patents, focusing on innovative processes for depositing essential materials in the manufacturing of various technological products.

Latest Patents:

Among Hunks' recent patents, two notable ones highlight his expertise in cobalt deposition selectivity on copper and dielectrics. This novel process involves the volatilization of a cobalt precursor, allowing for the deposition of cobalt on a substrate. The deposition conditions ensure that the temperature remains below 200°C, making it compatible with ultra-low dielectric materials. The resulting cobalt layer can serve various purposes, such as acting as a protective capping layer, an encapsulating layer, or an electrode in semiconductor devices, flat-panel displays, and solar panels.

Additionally, Hunks has patented a technique incorporating cyclopentadienyl titanium alkoxides with ozone-activated ligands for atomic layer deposition (ALD) of TiO2. This organotitanium compound enables precise titanium deposition on substrates, supporting the fabrication of microelectronic devices and precursor structures.

Career Highlights:

Throughout his career, Hunks has played an influential role in pushing the boundaries of materials deposition. He has worked with distinguished companies such as Advanced Technology Materials, Inc. (ATMI) and Entegris, Inc., where his contributions have elevated the industry's standards.

Collaborations:

Hunks has had the opportunity to collaborate with renowned experts in the field. Notably, he has worked closely with Chongying Xu and Jeffrey F. Roeder, fellow researchers and inventors. Such collaborations have allowed for the exchange of knowledge and the development of groundbreaking technologies.

Conclusion:

William Hunks has undeniably left an indelible mark in the realm of materials deposition. His extensive patent portfolio exemplifies his creativity, expertise, and dedication to advancing manufacturing processes and technologies. Through his notable contributions to the industry, Hunks has earned a reputation as an accomplished innovator, enabling the production of cutting-edge products across multiple sectors.

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