The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 02, 2017
Filed:
Sep. 26, 2013
Applicant:
Entegris, Inc., Billerica, MA (US);
Inventors:
Weimin Li, New Milford, CT (US);
David W. Peters, Burnet, TX (US);
Scott L. Battle, Cedar Park, TX (US);
William Hunks, Waterbury, CT (US);
Assignee:
Entegris, Inc., Billerica, MA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C07F 11/00 (2006.01); C01G 41/00 (2006.01); C23C 16/16 (2006.01); C23C 16/18 (2006.01); C23C 16/448 (2006.01); C01C 3/11 (2006.01); C09D 5/24 (2006.01); H01B 1/02 (2006.01);
U.S. Cl.
CPC ...
C01G 41/006 (2013.01); C01C 3/11 (2013.01); C07F 11/00 (2013.01); C07F 11/005 (2013.01); C09D 5/24 (2013.01); C23C 16/16 (2013.01); C23C 16/18 (2013.01); C23C 16/4485 (2013.01); H01B 1/02 (2013.01);
Abstract
A tungsten precursor useful for forming tungsten-containing material on a substrate, e.g., in the manufacture of microelectronic devices. The tungsten precursor is devoid of fluorine content, and may be utilized in a solid delivery process or other vapor deposition technique, to form films such as elemental tungsten for metallization of integrated circuits, or tungsten nitride films or other tungsten compound films that are useful as base layers for subsequent elemental tungsten metallization.