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For the Inventor, By the Inventor

Hsinchu, Taiwan

Wen-Chuan Wang

USPTO Granted Patents = 56 

Average Co-Inventor Count = 4.6

ph-index = 9

Forward Citations = 298(Granted Patents)

Forward Citations (Not Self Cited) = 243(Dec 10, 2025)


Inventors with similar research interests:


Location History:

  • Tainan, TW (2002 - 2009)
  • Taipei, TW (2004 - 2011)
  • Hsin-Chu, TW (2007 - 2021)

Company Filing History:

goldMedal55 out of 40,780 
 
Taiwan Semiconductor Manufacturing Comp. Ltd.
 patents
silverMedal1 out of 551 
 
E Ink Holdings Inc.
 patents

Years Active: 2002-2025

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Areas of Expertise:
Lithography Method
Integrated Circuit Fabrication
Electron Beam Lithography
Pattern Density Optimization
Mask Defect Repair
Holographic Reticle
Grid Refinement
Overlay Error Reduction
Image Resolution Enhancement
Critical Dimension Control
Wafer-to-Design Image Analysis
High-Throughput Scanning Exposure
56 patents (USPTO):Explore Patents
1. 12429776 - Lithography method with reduced impacts of mask defects (2025-09-30),
2. 12283215 - Display device and driving method thereof (2025-04-21),
3. 11100272 - Wafer-to-design image analysis (WDIA) system (2021-08-24),
4. 11061317 - Method of fabricating an integrated circuit with non-printable dummy features (2021-07-13),
5. 10955746 - Lithography method with reduced impacts of mask defects (2021-03-23),
6. 10811225 - Method of fabricating an integrated circuit with a pattern density-outlier-treatment for optimized pattern density uniformity (2020-10-20),
7. 10495982 - System and method for real-time overlay error reduction (2019-12-03),
8. 10431423 - Method of fabricating an integrated circuit with a pattern density-outlier-treatment for optimized pattern density uniformity (2019-10-01),
9. 10359695 - Method of fabricating an integrated circuit with non-printable dummy features (2019-07-23),
10. 10170276 - Method of fabricating an integrated circuit with a pattern density-outlier-treatment for optimized pattern density uniformity (2019-01-01),
11. 9870612 - Method for repairing a mask (2018-01-16),
12. 9810994 - Systems and methods for high-throughput and small-footprint scanning exposure for lithography (2017-11-07),
13. 9761411 - System and method for maskless direct write lithography (2017-09-12),
14. 9678434 - Grid refinement method (2017-06-13),
15. 9658538 - System and technique for rasterizing circuit layout data (2017-05-23),

Title: Inventor Wen-Chuan Wang

Introduction: Wen-Chuan Wang is a pioneering inventor based in Hsinchu, Taiwan, known for her groundbreaking contributions to the field of technology and innovation.

Latest Patents: Wang's most recent patents focus on advancements in semiconductor technology, particularly in the development of cutting-edge microchips for various electronic devices.

Career Highlights: With a career spanning over two decades, Wang has held key roles in leading tech companies, where she spearheaded research and development projects that have resulted in numerous patented inventions.

Collaborations: Throughout her career, Wang has collaborated with top engineers, researchers, and scientists from around the world, fostering a culture of innovation and excellence in all her projects.

Conclusion: Wen-Chuan Wang's dedication to pushing the boundaries of technology and her relentless pursuit of innovation have solidified her reputation as a trailblazing inventor in the tech industry.

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