Wen-Chuan Wang

This inventor holds 57 USPTO granted patents and 2 published patent applications, primarily in Lithography Techniques (CPC class G03F). Top assignees: Taiwan Semiconductor Manufacturing Comp. Ltd., E Ink Holdings Inc.. Active years: 2002-2026.

USPTO Granted Patents = 57 (Patent Applications = 2)

% Patents Active = 50.9

Average Co-Inventor Count = 4.6

ph-index = 9

Forward Citations = 303(Granted Patents)

Forward Citations (Not Self Cited) = 243(Dec 10, 2025)

Inventors with similar research interests:

Location History:

Tainan, TW (2002 - 2009)
Taipei, TW (2004 - 2011)
Hsin-Chu, TW (2007 - 2021)

Company Filing History:

55 out of 42,759

Taiwan Semiconductor Manufacturing Comp. Ltd.

Years Active: 2002-2026

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Areas of Expertise:

Lithography Method

Mask Defect Reduction

Integrated Circuit Fabrication

Electron Beam Patterning

Pattern Density Optimization

Real-Time Overlay Error

High-Throughput Exposure

Grid Refinement

Multiple-Patterning

Holographic Reticle

Proximity Correction

Error Diffusion

57 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 12688802 - Electronic paper display device and flexible substrate for electronic paper display device having frame (2026-07-21),

2. 12429776 - Lithography method with reduced impacts of mask defects (2025-09-30),

3. 12283215 - Display device and driving method thereof (2025-04-21),

4. 11100272 - Wafer-to-design image analysis (WDIA) system (2021-08-24),

5. 11061317 - Method of fabricating an integrated circuit with non-printable dummy features (2021-07-13),

6. 10955746 - Lithography method with reduced impacts of mask defects (2021-03-23),

7. 10811225 - Method of fabricating an integrated circuit with a pattern density-outlier-treatment for optimized pattern density uniformity (2020-10-20),

8. 10495982 - System and method for real-time overlay error reduction (2019-12-03),

9. 10431423 - Method of fabricating an integrated circuit with a pattern density-outlier-treatment for optimized pattern density uniformity (2019-10-01),

10. 10359695 - Method of fabricating an integrated circuit with non-printable dummy features (2019-07-23),

11. 10170276 - Method of fabricating an integrated circuit with a pattern density-outlier-treatment for optimized pattern density uniformity (2019-01-01),

12. 9870612 - Method for repairing a mask (2018-01-16),

13. 9810994 - Systems and methods for high-throughput and small-footprint scanning exposure for lithography (2017-11-07),

14. 9761411 - System and method for maskless direct write lithography (2017-09-12),

15. 9678434 - Grid refinement method (2017-06-13),

Title: Inventor Wen-Chuan Wang

Introduction: Wen-Chuan Wang is a pioneering inventor based in Hsinchu, Taiwan, known for her groundbreaking contributions to the field of technology and innovation.

Latest Patents: Wang's most recent patents focus on advancements in semiconductor technology, particularly in the development of cutting-edge microchips for various electronic devices.

Career Highlights: With a career spanning over two decades, Wang has held key roles in leading tech companies, where she spearheaded research and development projects that have resulted in numerous patented inventions.

Collaborations: Throughout her career, Wang has collaborated with top engineers, researchers, and scientists from around the world, fostering a culture of innovation and excellence in all her projects.

Conclusion: Wen-Chuan Wang's dedication to pushing the boundaries of technology and her relentless pursuit of innovation have solidified her reputation as a trailblazing inventor in the tech industry.