The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 03, 2019
Filed:
Oct. 28, 2013
Taiwan Semiconductor Manufacturing Company, Ltd., Hsin-Chu, TW;
Shih-Ming Chang, Zhubei, TW;
Wen-Chuan Wang, Hsinchu, TW;
Taiwan Semiconductor Manufacturing Company, Ltd., Hsin-Chu, TW;
Abstract
Disclosed is a lithography system. The lithography system includes a radiation source to provide radiation energy for lithography exposure; a substrate stage configured to secure a substrate; an imaging lens module configured to direct the radiation energy onto the substrate; at least one sensor configured to detect a radiation signal directed from the substrate; and a pattern extraction module coupled with the at least one sensor and designed to extract a pattern of the substrate based on the radiation signal.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile