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For the Inventor, By the Inventor

Lyle, WA, United States of America

Victor M Benveniste

This inventor holds 82 USPTO granted patents and 4 published patent applications and 1 EPO patent, primarily in Ion Beam Technology (CPC class 25049221). Top assignees: Axcelis Technologies, Inc., Varian Semiconductor Equipment Associates, Inc., Eaton Corporation. Active years: 1981-2018.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Victor M Benveniste. Retrieved from https://idiyas.com/inventor/victor-m-benveniste

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 82 

% Patents Active = 84.1


Average Co-Inventor Count = 2.1

ph-index = 15

Forward Citations = 766(Granted Patents)

Forward Citations (Not Self Cited) = 697(Dec 10, 2025)


Inventors with similar research interests:


Location History:

  • Magnolia, MA (US) (1981 - 1993)
  • Gloucester, MA (US) (1994 - 2010)
  • Lyle, WA (US) (2009 - 2018)

Company Filing History:

goldMedal33 out of 406 
 
Axcelis Technologies, Inc.
 patents
silverMedal24 out of 916 
 
Varian Semiconductor Equipment Associates, Inc.
 patents
bronzeMedal20 out of 5,989 
 
Eaton Corporation
 patents
4. 1 out of 154 
 
American Science and Engineering, Inc.
 patents
5. 1 out of 1 
 
Axchlisrtechnologies, Inc.
 patent
6. 1 out of 1 
 
Eaton Semi-Conductor Implantation Corporation
 patent
7. 1 out of 32 
 
Twin Creeks Technologies, Inc.
 patents
8. 1 out of 834,513 
Other
 patents

Years Active: 1981-2018

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Areas of Expertise:
Ion Beam Manipulation
Plasma Sources
Ion Implantation
Beam Quality
Electrostatic Lens
Mass Analysis
Temperature Control
Multimode Ion Source
Collimator Magnet
RF Plasma
Ribbon Beam
Focusing Techniques
82 patents (USPTO):Explore Patents
1. 10049861 - Inductively coupled RF plasma source with magnetic confinement and Faraday shielding (2018-08-14),
2. 9793087 - Techniques and apparatus for manipulating an ion beam (2017-10-17),
3. 9297063 - Plasma potential modulated ion implantation system (2016-03-29),
4. 9018829 - Excited gas injection for ion implant control (2015-04-28),
5. 8847496 - Inductively coupled plasma flood gun using an immersed low inductance RF coil and multicusp magnetic arrangement (2014-09-30),
6. 8604443 - System and method for manipulating an ion beam (2013-12-10),
7. 8501624 - Excited gas injection for ion implant control (2013-08-06),
8. 8471476 - Inductively coupled plasma flood gun using an immersed low inductance FR coil and multicusp magnetic arrangement (2013-06-25),
9. 8466431 - Techniques for improving extracted ion beam quality using high-transparency electrodes (2013-06-18),
10. 8436318 - Apparatus for controlling the temperature of an RF ion source window (2013-05-07),
11. 8357912 - Techniques for providing a multimode ion source (2013-01-22),
12. 8263941 - Mass analysis magnet for a ribbon beam (2012-09-11),
13. 8188448 - Temperature controlled ion source (2012-05-29),
14. 8183542 - Temperature controlled ion source (2012-05-22),
15. 8129695 - System and method for controlling deflection of a charged particle beam within a graded electrostatic lens (2012-03-06),

Title: Victor M. Benveniste: A Pioneer in Plasma Science and Ion Beam Manipulation

Introduction

Victor M. Benveniste, based in Lyle, Washington, is an esteemed inventor known for his extensive contributions to the fields of plasma technology and ion beam manipulation. With an impressive portfolio of 82 patents, he has made significant strides in the development of innovative technologies that have far-reaching applications in various industries.

Latest Patents

Among Victor's latest patents is the "Inductively Coupled RF Plasma Source with Magnetic Confinement and Faraday Shielding." This invention involves a novel inductively coupled RF plasma source designed to provide magnetic confinement that reduces plasma losses, as well as Faraday shielding to suppress parasitic capacitive components. The system comprises an RF power source, plasma chamber, an array of permanent magnets, and an antenna array. The plasma chamber features walls and a dielectric window with an inner surface that seals the chamber's volume. The permanent magnet array is strategically embedded within the dielectric window walls, ensuring efficient magnetic field formation to support the plasma.

Another noteworthy patent is focused on "Techniques and Apparatus for Manipulating an Ion Beam." This method includes generating an ion beam, deflecting it at an inclination, and passing it through an aperture in a magnetic assembly where quadrupole and dipole fields are created for enhanced manipulation of the beam's trajectory.

Career Highlights

Victor's impressive career includes key positions at renowned companies such as Axcelis Technologies, Inc. and Varian Semiconductor Equipment Associates, Inc. Through his roles at these organizations, he has been instrumental in advancing cutting-edge technologies that leverage plasma and ion beam solutions for improved functionality and performance in diverse applications.

Collaborations

Throughout his career, Victor has collaborated with several esteemed professionals, notably Frank Sinclair and Peter Lawrence Kellerman. These partnerships have enriched his research and development endeavors, contributing significantly to the innovation landscape in which he operates.

Conclusion

Victor M. Benveniste stands as a trailblazer in the realms of plasma technology and ion beam manipulation. His 82 patents reflect a dedication to innovation and a commitment to pushing the boundaries of scientific understanding. With a storied career and impactful collaborations, Victor continues to inspire future generations of inventors and researchers in the field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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