The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 10, 2013
Filed:
Nov. 11, 2010
Frank Sinclair, Quincy, MA (US);
Victor M. Benveniste, Lyle, WA (US);
Svetlana Radovanov, Marblehead, MA (US);
James S. Buff, Brookline, NH (US);
Frank Sinclair, Quincy, MA (US);
Victor M. Benveniste, Lyle, WA (US);
Svetlana Radovanov, Marblehead, MA (US);
James S. Buff, Brookline, NH (US);
Varian Semiconductor Equipment Associates, Inc., Gloucester, MA (US);
Abstract
A system for manipulating an ion beam having a principal axis includes an upper member having a first and a second coil generally disposed in different regions of the upper member and configured to conduct, independently of each other, a first and a second current, respectively. A lower member includes a third and a fourth coil that are generally disposed opposite to respective first and second coils and are configured to conduct, independently of each other, a third and a fourth current, respectively. A lens gap is defined between the upper and lower members, and configured to transmit the ion beam, wherein the first through fourth currents produce a 45 degree quadrupole field that exerts a rotational force on the ion beam about its principal axis.