logo

For the Inventor, By the Inventor

Inagi, Japan

Masato Muraki

This inventor holds 93 USPTO granted patents and 1 published patent application and 6 EPO patents, primarily in Charged Particle Lithography (CPC class H01J37-3177). Top assignees: Canon Kabushiki Kaisha, Hitachi-High-Technologies Corporation, Hitachi, Ltd.. Active years: 1990-2019.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Masato Muraki. Retrieved from https://idiyas.com/inventor/masato-muraki

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 93 

% Patents Active = 73.1

 

Average Co-Inventor Count = 1.8

ph-index = 28

Forward Citations = 2,135(Granted Patents)

Forward Citations (Not Self Cited) = 1,810(Dec 10, 2025)


Inventors with similar research interests:


Location History:

  • Kawasaki-shi, Kanagawa-ken, JP (1993)
  • Yokohama, JP (1990 - 1996)
  • Tokyo, JP (2001 - 2007)
  • Inagi, JP (1994 - 2019)

Company Filing History:

goldMedal88 out of 93,136 
 
Canon Kabushiki Kaisha
 patents
silverMedal12 out of 2,874 
 
Hitachi-High-Technologies Corporation
 patents
bronzeMedal5 out of 42,743 
 
Hitachi, Ltd.
 patents
4. 4 out of 2,283 
 
Adv Antest Corporation
 patents
5. 2 out of 54 
 
Canon Inc.
 patents
6. 3 out of 834,601 
Other
 patents
where one patent can have more than one assignee

Years Active: 1990-2019

Loading Chart...
Loading Chart...
Areas of Expertise:
Charged Particle Beam
Lithography System
Drawing Apparatus
Device Manufacturing
Electron Beam Exposure
Pattern Data Creation
Sputtering Method
Aberration Measuring
Deflector Manufacturing
Electrooptic System
Data Processing Method
Electron Source
93 patents (USPTO):Explore Patents
1. 10361067 - Drawing apparatus, and method of manufacturing article by controlling a plurality of charged particle optical systems based on respective sets of sub-drawing regions (2019-07-23),
2. 9690201 - Drawing method and method of manufacturing article (2017-06-27),
3. 9583311 - Drawing apparatus, lithography system, pattern data creation method, drawing method, and method of manufacturing articles (2017-02-28),
4. 9558916 - Lithography system and method of manufacturing articles (2017-01-31),
5. 9455124 - Drawing apparatus, and method of manufacturing article (2016-09-27),
6. 9293292 - Drawing apparatus, and method of manufacturing article (2016-03-22),
7. 9245715 - Drawing apparatus, and method of manufacturing article (2016-01-26),
8. 9171698 - Drawing apparatus, and method of manufacturing article (2015-10-27),
9. 9040935 - Blanking apparatus, drawing apparatus, and method of manufacturing article (2015-05-26),
10. 9001387 - Drawing apparatus, data processing method, and method of manufacturing article that transform partially overlapping regions using different transformation rules (2015-04-07),
11. 8759797 - Drawing apparatus, drawing method, and method of manufacturing article (2014-06-24),
12. 8716672 - Charged particle optical system, drawing apparatus, and method of manufacturing article (2014-05-06),
13. 8692218 - Charged particle beam exposure apparatus (2014-04-08),
14. 8610082 - Drawing apparatus and method of manufacturing article (2013-12-17),
15. 8083562 - Method of manufacturing image display apparatus using sputtering (2011-12-27),

Introduction

Masato Muraki, an esteemed inventor based in Inagi, Japan, has made significant contributions to the fields of charged particle optics and drawing apparatus technologies. With an impressive portfolio that includes 93 patents, Muraki stands out as a key player in innovative invention and technology development.

Latest Patents

Among his latest innovations, Muraki's patents include a sophisticated drawing apparatus and a method of manufacturing articles by controlling multiple charged particle optical systems. This drawing apparatus utilizes a plurality of charged particle optical systems arranged in a specific configuration. It features a storage unit that stores drawing data for various sub-drawing regions and a controller that determines the drawing regions on the substrate, allowing for precise control over each optical system based on corresponding sets of sub-drawing regions. The methodologies also encompass a detailed process for drawing cut patterns across linear patterns, ensuring that the intervals between cut patterns conform to defined relations based on predetermined dimensions.

Career Highlights

Masato Muraki has worked with several leading companies, notably Canon and Hitachi High-Technologies Corporation, where he has developed and refined various technologies that leverage charged particle beams. His extensive career reflects a commitment to pushing the boundaries of optical system applications in diverse sectors.

Collaborations

Throughout his career, Muraki has collaborated with notable professionals such as Haruo Yoda and Yoshikiyo Yui. These collaborations have further enhanced his work, fostering the exchange of innovative ideas and solutions that have significantly advanced the technology surrounding charged particle optics.

Conclusion

Masato Muraki’s unwavering dedication to innovation and technology development has resulted in numerous patents that reflect his expertise in charged particle systems and their applications. As an influential inventor, his work continues to inspire breakthroughs that shape the future of manufacturing and optical technologies.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…