The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 27, 2016

Filed:

Apr. 23, 2014
Applicant:

Canon Kabushiki Kaisha, Tokyo, JP;

Inventors:

Masato Muraki, Inagi, JP;

Yoshihiro Hirata, Utsunomiya, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01J 37/30 (2006.01); H01J 37/317 (2006.01); H01J 37/302 (2006.01);
U.S. Cl.
CPC ...
H01J 37/3177 (2013.01); H01J 37/3026 (2013.01); H01J 2237/31766 (2013.01);
Abstract

The present invention provides a drawing apparatus for performing drawing on a substrate with a charged particle beam, including a stage configured to hold the substrate and be moved, a charged particle optical system configured to irradiate a plurality of charged particle beams arrayed along a first axis, and a controller configured to control the drawing so as to perform multiple irradiation of a target portion on the substrate with the plurality of charged particle beams, wherein the controller configured to control the drawing such that the stage is moved in one direction along the first axis with respect to a plurality of regions formed on the substrate along the first axis, and a deflection of charged particle beam for a displacement of charged particle beam along the first axis is performed with respect to drawing on each of the plurality of regions.


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