Canon Kabushiki Kaisha

Hitachi-high-technologies Corporation

Hitachi, Ltd.

Adv Antest Corporation

Other

Canon Inc.

Masato Muraki

Haruo Yoda

Yoshikiyo Yui

Yoshinori Nakayama

Hiroya Ohta

Osamu Kamimura

Akiyoshi Suzuki

Yasunari Sohda

Haruhito Ono

Yoshihiro Hirata

Susumu Gotoh

Tomoyuki Morita

Shinichi Hashimoto

Kazuhiro Takahashi

Akira Miyake

Takahisa Shiozawa

Yuichi Iwasaki

Kenji Tamamori

Masayoshi Esashi

Kouji Asano

Masaki Hosoda

Masaki Takakuwa

Shin-ichi Hashimoto

Yoshiaki Moro

Masahiko Okunuki

Ryo Fujita

Hiroyuki Ishii

Shigeru Terashima

Norio Saitou

Haruna Kawashima

Kimiaki Ando

Shin Matsui

Susumu Goto

Shunzo Imai

Yuji Inoue

Shigeru Hayata

Kentaro Sano

Yasuhiro Someda

Satoru Oishi

Masakazu Sugaya

Mahito Negishi

Kouichirou Tsujita

Sayaka Tanimoto

Hiromasa Mitani

Masato Aketagawa

Go Tsuchiya

Koichi Wakizaka

Hiromi Kinebuchi

Yoshinori c/o Hitachi Ltd Ipg Nakayama

A drawing apparatus includes: a plurality of charged particle optical systems arranged along a first direction; a storage configured to store drawing data shared by the plurality of charged particle optical systems with respect to each of sub-drawing regions obtained by dividing a drawing region on the substrate of each of the plurality of charged particle optical systems in the first direction; and a controller configured to determine a drawing region on the substrate by each of the plurality of charged particle optical systems as a set of the sub-drawing regions, and control each of the plurality of charged particle optical systems based on a corresponding set of the sub-drawing regions.

Drawing apparatus, and method of manufacturing article by controlling a plurality of charged particle optical systems based on respective sets of sub-drawing regions

A charged particle beam drawing apparatus draws a plurality of cut patterns on a plurality of first linear patterns arranged to extend in a first direction and align themselves at a predetermined pitch P in a second direction perpendicular to the first direction. The plurality of cut patterns are drawn so that an interval Ai in the second direction between the centers of each pair of cut patterns adjacent to each other in the second direction (i is a number which specifies the pair) satisfies a relation:(=1, 2, 3, . . . )where X is a dimension defined by the pitch P.

Drawing method and method of manufacturing article

At least one drawing apparatus according to an exemplary embodiment includes a plurality of optical systems and repeats an operation to draw a pattern on a substrate while partly overlapping stripe-shaped regions drawn by the optical systems. The drawing apparatus includes a creation unit configured to create data to be supplied to each of the plurality of optical systems by using a plurality of sub pattern data, each of the plurality of sub pattern data serving as unit data of pattern data used by the plurality of optical systems, corresponding to a region having a width obtainable by dividing the stripe-shaped regions in a drawing width direction, and including information relating to continuity of drawing instruction data and exposure amount information. The creation unit is configured to create the data by changing exposure amount information corresponding to an overlapping drawing region based on the information relating to the continuity.

Drawing apparatus, lithography system, pattern data creation method, drawing method, and method of manufacturing articles

At least one method of manufacturing articles and at least one lithography system are provided herein. A lithography system according to an exemplary embodiment of the present disclosure includes a drawing apparatus that includes a plurality of optical systems and draws a pattern on a substrate with beams having been respectively shaped by the plurality of optical systems, and a transmission unit configured to select pattern data to be used by the drawing apparatus from a plurality of types of pattern data commonly used by the plurality of optical systems and configured to transmit the selected pattern data to the drawing apparatus. The pattern data is a set of data including a plurality of sub pattern data, and a width of a stripe-shaped drawing region corresponding to one sub pattern data piece is equivalent to a length obtainable by dividing a drawing width of the beams by an integer value.

Lithography system and method of manufacturing articles

The present invention provides a drawing apparatus for performing drawing on a substrate with a charged particle beam, including a stage configured to hold the substrate and be moved, a charged particle optical system configured to irradiate a plurality of charged particle beams arrayed along a first axis, and a controller configured to control the drawing so as to perform multiple irradiation of a target portion on the substrate with the plurality of charged particle beams, wherein the controller configured to control the drawing such that the stage is moved in one direction along the first axis with respect to a plurality of regions formed on the substrate along the first axis, and a deflection of charged particle beam for a displacement of charged particle beam along the first axis is performed with respect to drawing on each of the plurality of regions.

Drawing apparatus, and method of manufacturing article

The present invention provides a drawing apparatus for performing drawing on a substrate with a charged particle beam, the apparatus including a controller configured to perform control of the drawing performed by movement of a stage and a blanking function of each of a plurality of charged particle optical systems, wherein the controller is configured to perform, with respect to a first charged particle optical system, of the plurality of charged particle optical systems, from a plurality of charged particle beams reach a first region and a second region, formed on the substrate and adjacent to each other, the control such that the drawing is performed only in one of the first and second regions with a first portion of charged particle beams of the plurality of charged particle beams with the stage moved in a second direction.

The present invention provides a drawing apparatus for performing drawing on a substrate with a plurality of charged particle beams, comprising a blanker array including first and second groups, each of which includes at least one blanker, a deflector configured to deflect the plurality of charged particle beams to scan the plurality of charged particle beams on the substrate, and a controller configured to respectively supply first and second control signals to the first and second groups at first and second timings, wherein the first and second groups are respectively arranged at such relative positions that a positional difference between respective drawing regions thereof, due to a difference between the first and second timings, in a scanning direction of the deflector is compensated for.

A drawing apparatus for performing drawing on a substrate with a charged particle beam, includes: a controller configured to control a dose of the charge particle beam at each of a plurality of positions of the charged particle beam on the substrate based on information of displacement of each of the plurality of positions from a target position corresponding thereto and a target dose of the charged particle beam at the target position corresponding to each of the plurality of positions.

The present invention provides a blanking apparatus comprising a plurality of blankers configured to respectively blank a plurality of beams with respect to a target position on an object, and a driving device configured to drive the plurality of blankers, wherein the driving device includes a change device configured to change relation between a combination of beams of the plurality of beams, and a target dose.

Blanking apparatus, drawing apparatus, and method of manufacturing article

A drawing apparatus performs drawing on a first partial region and a second partial region. The first and second partial regions having an overlap region in which the first and second partial regions overlap each other. The apparatus includes a transformation device configured to transform first pattern data for the first partial region into first quantized pattern data in accordance with a first transformation rule, and to transform second pattern data for the second partial region into second quantized pattern data in accordance with a second transformation rule different from the first transformation rule, and a controller configured to control the drawing on the first partial region based on the first quantized pattern data, and to control the drawing on the second partial region based on the second quantized pattern data.

Drawing apparatus, data processing method, and method of manufacturing article that transform partially overlapping regions using different transformation rules

A drawing apparatus performs drawing overlaid with a shot formed on a substrate with a plurality of charged particle beams based on a plurality of drawing stripe data that constitute drawing data. The apparatus includes a charged particle optical system configured to generate the plurality of charged particle beams; and a controller configured to generate a plurality of intermediate stripe data as data of a plurality of intermediate stripes, adjacent ones of the plurality of intermediate stripes overlapping with each other, to obtain information on distortion of the shot, and to transform the plurality of intermediate stripe data based on the information on the distortion to generate the plurality of drawing stripe data.

Drawing apparatus, drawing method, and method of manufacturing article

The present invention provides a charged particle optical system which emits a charged particle beam, the system including an electrostatic lens, and a grid electrode opposed to the electrostatic lens along an optical axis of the electrostatic lens, and configured to form an electrostatic field in cooperation with the electrostatic lens, wherein the grid electrode is configured such that an electrode surface, opposed to the electrostatic lens, of the grid electrode has a distance, from the electrostatic lens in a direction of the optical axis, which varies with a position in the electrode surface.

Charged particle optical system, drawing apparatus, and method of manufacturing article

An exposure apparatus which draws a pattern on a substrate with a charged particle beam is disclosed. The exposure apparatus includes a blanker which controls, in accordance with a dose pattern including a plurality of pulses, whether to allow a charged particle beam to strike the substrate, and a controller which executes calibration for correcting the dose pattern to obtain a pattern having the target line width.

Charged particle beam exposure apparatus

A drawing apparatus performs drawing on a substrate with charged particle beams. The drawing apparatus includes an irradiation optical system including a collimator lens; an aperture array configured to split the charged particle beam into a plurality of charged particle beams; a converging lens array configured to form a plurality of crossovers of the plurality of charged particle beams; and a projection optical system including an element in which a plurality of apertures corresponding to the plurality of crossovers are formed, and a plurality of projection lenses corresponding to the apertures. The converging lens array includes converging lenses disposed such that each of the plurality of crossovers, which are formed by the converging lenses from the charged particle beam incident on the aperture array at incidence angles associated with aberration of the irradiation optical system, is aligned with corresponding one of the apertures in the element.

Drawing apparatus and method of manufacturing article

A manufacturing method of an image display apparatus having a substrate and a conductive supporting frame formed at a periphery of the substrate includes steps of forming a wiring on the substrate, and forming an insulating layer on the wiring. The insulating layer includes a silicon nitride or a silicon oxide deposited by a sputtering technique. The insulating layer is seal-bonded with the conductive supporting frame.

Method of manufacturing image display apparatus using sputtering

Growing community of inventors

Inagi, Japan

Masato Muraki