The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 31, 2017
Filed:
Oct. 21, 2015
Canon Kabushiki Kaisha, Tokyo, JP;
Masato Muraki, Inagi, JP;
Yoshihiro Hirata, Fuchu, JP;
Canon Kabushiki Kaisha, Tokyo, JP;
Abstract
At least one method of manufacturing articles and at least one lithography system are provided herein. A lithography system according to an exemplary embodiment of the present disclosure includes a drawing apparatus that includes a plurality of optical systems and draws a pattern on a substrate with beams having been respectively shaped by the plurality of optical systems, and a transmission unit configured to select pattern data to be used by the drawing apparatus from a plurality of types of pattern data commonly used by the plurality of optical systems and configured to transmit the selected pattern data to the drawing apparatus. The pattern data is a set of data including a plurality of sub pattern data, and a width of a stripe-shaped drawing region corresponding to one sub pattern data piece is equivalent to a length obtainable by dividing a drawing width of the beams by an integer value.