The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 28, 2017

Filed:

Oct. 21, 2015
Applicant:

Canon Kabushiki Kaisha, Tokyo, JP;

Inventors:

Masato Muraki, Inagi, JP;

Yoshihiro Hirata, Fuchu, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G21K 5/10 (2006.01); G21K 5/00 (2006.01); H01J 3/14 (2006.01); H01J 37/317 (2006.01); H01J 37/302 (2006.01);
U.S. Cl.
CPC ...
H01J 37/3177 (2013.01); H01J 37/3026 (2013.01); H01J 2237/31762 (2013.01); H01J 2237/31764 (2013.01);
Abstract

At least one drawing apparatus according to an exemplary embodiment includes a plurality of optical systems and repeats an operation to draw a pattern on a substrate while partly overlapping stripe-shaped regions drawn by the optical systems. The drawing apparatus includes a creation unit configured to create data to be supplied to each of the plurality of optical systems by using a plurality of sub pattern data, each of the plurality of sub pattern data serving as unit data of pattern data used by the plurality of optical systems, corresponding to a region having a width obtainable by dividing the stripe-shaped regions in a drawing width direction, and including information relating to continuity of drawing instruction data and exposure amount information. The creation unit is configured to create the data by changing exposure amount information corresponding to an overlapping drawing region based on the information relating to the continuity.


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