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For the Inventor, By the Inventor

Beverly, MA, United States of America

Axcelis Technologies, Inc.


USPTO Granted Patents = 406

% Expired Patents = 24.4


Trademarks = 2

Forward Citations = 6,291

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302 inventors (with patents filed for the assignee):

goldMedal Bo H Vanderberg (43 out of 43 patents)

silverMedal Neil K Colvin (36 out of 36 patents)

bronzeMedal Victor M Benveniste (33 out of 82 patents)

4.  William F DiVergilio (30 out of 31 patents)

5.  William Davis Lee (27 out of 113 patents)

6.  Edward Eisner (25 out of 25 patents)

7.  Shu Satoh (19 out of 29 patents)

8.  Neil J Bassom (19 out of 45 patents)

9.  Tseh-Jen Hsieh (18 out of 26 patents)

10.  Joseph Ferrara (18 out of 18 patents)

11.  Michael A Graf (18 out of 30 patents)

12.  Peter Lawrence Kellerman (18 out of 58 patents)

13.  Yongzhang Huang (17 out of 18 patents)

14.  Robert D Rathmell (16 out of 16 patents)

15.  Ivan Berry (15 out of 20 patents)


Core Competencies:
Ion Beam
Gas Inlet
Aluminum Ion
Contamination Control
Electrostatic Clamp
Wafer Cooling
Hydrogen Co-Gas
Beam Profiling
Ion Source
Semiconductor Processing
Multi-Wavelength Sensors
Dynamic Threshold

406 patents:

1. 12713870 - SYSTEM AND METHOD OF VERIFYING WORKPIECE ALIGNMENT (2026-08-18),
2. 12700562 - Method and apparatus for continuous chained energy ion implantation (2026-08-04),
3. 12651722 - Blended energy implant (2026-06-09),
4. 12626885 - Wire or rod shaped extraction electrode optics (2026-05-12),
5. 12571088 - High incidence angle graphite for particle control with dedicated low sputter yield ion beam (2026-03-10),
6. 12566064 - Twist and tilt verification using diffraction patterns (2026-03-03),
7. 12497687 - Ion implantation system and method for implanting aluminum using non-fluorine-containing halide species or molecules (2025-12-16),
8. 12476085 - Shielded gas inlet for an ion source (2025-11-18),
9. 12463003 - High temperature ion source (2025-11-04),
10. 12431332 - High energy implanter with small footprint (2025-09-30),
11. 12354834 - Method for setting gap between cathode and filament (2025-07-08),
12. 12154763 - Hydraulic feed system for an ion source (2024-11-26),
13. 12112918 - Dual source injector with switchable analyzing magnet (2024-10-08),
14. 12051561 - Fluorine based molecular co-gas when running dimethylaluminum chloride as a source material to generate an aluminum ion beam (2024-07-30),
15. 11923169 - Apparatus and method for metal contamination control in an ion implantation system using charge stripping mechanism (2024-03-05),
Axcelis Technologies, Inc. is a leading provider of innovative, high-productivity solutions for the semiconductor industry. For over 40 years, they have been developing and manufacturing ion implantation systems, a critical technology used in the fabrication of semiconductors. With a focus on enabling advanced chip production, Axcelis' solutions deliver the precision, speed, and reliability needed to meet the industry's evolving requirements. Their globally recognized products and superior customer support have made them a trusted partner for semiconductor manufacturers worldwide.
This text is generated by artificial intelligence and may not be accurate.

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USPTO Data Jan 1 1976 - Sep 22 2026

Axcelis Technologies, Inc.
406 Patents

#1 in Beverly, MA

#66 in Massachusetts

#1,156 in US

#2,305 in the World

Beverly, MA (US)
Beverly, MA, United States of America

Axcelis Technologies, Inc.

Forward Citations = 6,291

302 inventors:

goldMedal Bo H Vanderberg (43 out of 43 patents)

silverMedal Neil K Colvin (36 out of 36 patents)

bronzeMedal Victor M Benveniste (33 out of 82 patents)

4.  William F DiVergilio (30 out of 31 patents)

5.  William Davis Lee (27 out of 113 patents)

Please report any incorrect information to [email protected]
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