For the Inventor, By the Inventor

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Beverly, MA, United States of America

Axcelis Technologies, Inc.

USPTO Granted Patents = 406

% Expired Patents = 24.4

EPO Patents = 26

Trademarks = 2

Forward Citations = 6,291

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302 inventors (with patents filed for the assignee):

Bo H Vanderberg (43 out of 43 patents)

Neil K Colvin (36 out of 36 patents)

Victor M Benveniste (33 out of 82 patents)

4. William F DiVergilio (30 out of 31 patents)

5. William Davis Lee (27 out of 113 patents)

6. Edward Eisner (25 out of 25 patents)

7. Shu Satoh (19 out of 29 patents)

8. Neil J Bassom (19 out of 45 patents)

9. Tseh-Jen Hsieh (18 out of 26 patents)

10. Joseph Ferrara (18 out of 18 patents)

11. Michael A Graf (18 out of 30 patents)

12. Peter Lawrence Kellerman (18 out of 58 patents)

13. Yongzhang Huang (17 out of 18 patents)

14. Robert D Rathmell (16 out of 16 patents)

15. Ivan Berry (15 out of 20 patents)

Core Competencies:

Ion Beam

Gas Inlet

Aluminum Ion

Contamination Control

Electrostatic Clamp

Wafer Cooling

Hydrogen Co-Gas

Beam Profiling

Ion Source

Semiconductor Processing

Multi-Wavelength Sensors

Dynamic Threshold

406 patents: Sort by Forward Citations

1. 12713870 - SYSTEM AND METHOD OF VERIFYING WORKPIECE ALIGNMENT (2026-08-18),

2. 12700562 - Method and apparatus for continuous chained energy ion implantation (2026-08-04),

3. 12651722 - Blended energy implant (2026-06-09),

4. 12626885 - Wire or rod shaped extraction electrode optics (2026-05-12),

5. 12571088 - High incidence angle graphite for particle control with dedicated low sputter yield ion beam (2026-03-10),

6. 12566064 - Twist and tilt verification using diffraction patterns (2026-03-03),

7. 12497687 - Ion implantation system and method for implanting aluminum using non-fluorine-containing halide species or molecules (2025-12-16),

8. 12476085 - Shielded gas inlet for an ion source (2025-11-18),

9. 12463003 - High temperature ion source (2025-11-04),

10. 12431332 - High energy implanter with small footprint (2025-09-30),

11. 12354834 - Method for setting gap between cathode and filament (2025-07-08),

12. 12154763 - Hydraulic feed system for an ion source (2024-11-26),

13. 12112918 - Dual source injector with switchable analyzing magnet (2024-10-08),

14. 12051561 - Fluorine based molecular co-gas when running dimethylaluminum chloride as a source material to generate an aluminum ion beam (2024-07-30),

15. 11923169 - Apparatus and method for metal contamination control in an ion implantation system using charge stripping mechanism (2024-03-05),

Company Overview

Axcelis Technologies, Inc., headquartered in Beverly, MA, specializes in ion implantation technology, a critical process in semiconductor manufacturing. The company develops advanced systems that enhance the performance and efficiency of semiconductor devices. Its core technology areas include ion beam applications, contamination control, and wafer cooling solutions, which are essential for producing high-quality chips. Axcelis is committed to innovation in the semiconductor industry, providing tools that enable manufacturers to meet the demands of modern electronics.

Profile summary synthesized from public USPTO records and patent filings.

Company Badge

USPTO Data Jan 1 1976 - Oct 13 2026

406 Patents

#1 in Beverly, MA

#66 in Massachusetts

#1,156 in US

#2,308 in the World

Beverly, MA, United States of America

Axcelis Technologies, Inc.

Forward Citations = 6,291

302 inventors:

Bo H Vanderberg (43 out of 43 patents)

Neil K Colvin (36 out of 36 patents)

Victor M Benveniste (33 out of 82 patents)

4. William F DiVergilio (30 out of 31 patents)

5. William Davis Lee (27 out of 113 patents)

IDiyas Innovation Intelligence. (2026). Company Patent Portfolio: Axcelis Technologies, Inc.. Retrieved from https://idiyas.com/company/axcelis-technologies

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]

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