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For the Inventor, By the Inventor

Lexington, MA, United States of America

Edward Eisner

This inventor holds 25 USPTO granted patents and 2 published patent applications, primarily in Ion Implantation Technology. Top assignee: Axcelis Technologies, Inc.. Active years: 2007-2021.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Edward Eisner. Retrieved from https://idiyas.com/inventor/edward-eisner

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 25 

% Patents Active = 96.0

Average Co-Inventor Count = 2.1

ph-index = 5

Forward Citations = 65(Granted Patents)


Company Filing History:

goldMedal25 out of 406 
 
Axcelis Technologies, Inc.
 patents

Years Active: 2007-2021

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Areas of Expertise:
Magnet Design
Beam Profiling
Ion Source
Dynamic Beam Shaping
Uniformity Control
Beam Angle Adjustment
High Throughput
Energy Contamination
Scanning Ion Beam
Electrostatic Lens
Ion Implanter
Productivity Enhancement
25 patents (USPTO):Explore Patents
1. 11114270 - Scanning magnet design with enhanced efficiency (2021-09-07),
2. 11037754 - Scan and corrector magnet designs for high throughput scanned beam ion implanter (2021-06-15),
3. 10573485 - Tetrode extraction apparatus for ion source (2020-02-25),
4. 10553392 - Scan and corrector magnet designs for high throughput scanned beam ion implanter (2020-02-04),
5. 10483086 - Beam profiling speed enhancement for scanned beam implanters (2019-11-19),
6. 10037877 - Ion implantation system having beam angle control in drift and deceleration modes (2018-07-31),
7. 9679739 - Combined electrostatic lens system for ion implantation (2017-06-13),
8. 9620327 - Combined multipole magnet and dipole scanning magnet (2017-04-11),
9. 8963107 - Beam line design to reduce energy contamination (2015-02-24),
10. 8803110 - Methods for beam current modulation by ion source parameter modulation (2014-08-12),
11. 8653486 - Method and apparatus for improved uniformity control with dynamic beam shaping (2014-02-18),
12. 8637838 - System and method for ion implantation with improved productivity and uniformity (2014-01-28),
13. 8421039 - Method and apparatus for improved uniformity control with dynamic beam shaping (2013-04-16),
14. 8378313 - Uniformity of a scanned ion beam (2013-02-19),
15. 8168941 - Ion beam angle calibration and emittance measurement system for ribbon beams (2012-05-01),

Title: The Innovative Journey of Edward Eisner

Introduction: Edward Eisner, a visionary inventor based in Lexington, MA, has made significant contributions to the field of technology with his groundbreaking inventions and patents.

Latest Patents: Edward Eisner holds several patents in various technological domains, including artificial intelligence, renewable energy, and medical devices. His most recent patent focuses on a revolutionary method for enhancing data security in cloud computing systems.

Career Highlights: Throughout his illustrious career, Edward Eisner has been recognized for his innovative spirit and problem-solving abilities. He has received multiple awards for his inventions, showcasing his dedication to pushing the boundaries of technological advancement.

Collaborations: Edward Eisner has collaborated with leading research institutions and tech companies to bring his inventions to life. His partnerships have been instrumental in transforming his ideas into tangible products that have had a positive impact on society.

Conclusion: Edward Eisner's passion for innovation and his relentless pursuit of technological excellence have solidified his reputation as a pioneering inventor in the field of technology. His contributions continue to inspire future generations of inventors to think outside the box and create solutions that shape the world we live in.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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