The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 12, 2014
Filed:
Sep. 29, 2006
Michael A. Graf, Belmont, MA (US);
Edward C. Eisner, Lexington, MA (US);
William F. Divergilio, Brookline, MA (US);
Daniel R. Tieger, Manchester, MA (US);
Michael A. Graf, Belmont, MA (US);
Edward C. Eisner, Lexington, MA (US);
William F. DiVergilio, Brookline, MA (US);
Daniel R. Tieger, Manchester, MA (US);
Axcelis Technologies, Inc., Beverly, MA (US);
Abstract
Beam current is adjusted during ion implantation by adjusting one or more parameters of an ion source. The ion beam is generated or provided by a non-arc discharge based ion source, such as an electron gun driven ion source or an RF driven ion source. A beam current adjustment amount is determined. Then, one or more parameters of the ion source are adjusted according to the determined beam current adjustment amount. The beam current is provided having a modulated beam current.